PCE66H Heatable UV-Ozone Cleaner with Quartz Chamber and Programmable Temperature Control
The PCE66H is engineered to deliver ultra-clean surfaces by eliminating nanometer-thick hydrocarbon contaminants through a dry UV-ozone oxidation process. This system is particularly suited for cleaning substrates such as silicon, germanium, gallium arsenide, glass, and ceramic surfaces prior to thin-film deposition or other surface-sensitive treatments.
The cleaning mechanism involves irradiating the substrate surface with ultraviolet light at 185nm and 254nm wavelengths, which generates reactive ozone and atomic oxygen species. These oxidize and volatilize organic contaminants, enhancing surface wettability and cleanliness. The PCE66H integrates a quartz sample holder within a 6″x6″ chamber and includes a built-in stainless steel W-shaped heating tube capable of heating samples up to 150°C. Temperature is precisely managed via a PID controller with programmable 30-segment temperature profiles and overheat protection.
Wichtigste Merkmale
- Four 8W UV lamp tubes emitting dual wavelengths (185nm and 254nm) for effective surface oxidation.
- Quartz sample holder measuring 105mm x 102mm x 20mm, suitable for substrates up to 6″x6″.
- Built-in stainless steel heating tube with maximum temperature of 150°C and PID automatic control.
- Programmable 30-segment temperature control with ±1°C accuracy and overheat protection.
- Exhaust fan with 80mm diameter duct for safe removal of ozone gas.
- Timer-controlled UV irradiation from 0 to 30 minutes for process flexibility.
- Compact design optimized for laboratory benchtop use.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | AC 220V ±10%, 50/60Hz (AC110V via optional 1000W transformer) |
| Gesamtstromverbrauch | 750 W |
| UV Lamp Configuration | 4 x 8W UV lamp tubes (32W total) |
| UV Wavelengths | 185 nm and 254 nm |
| Irradiation Area | 150 mm x 150 mm |
| Light Intensity | 80 μW/cm² |
| Sample Holder Material & Size | Quartz, 105 mm x 102 mm x 20 mm (L x W x H) |
| Heating Element | W-shaped stainless steel tube |
| Maximum Heating Temperature | 150°C |
| Temperaturregelung | PID controller with 30-segment programmable profiles, ±1°C accuracy |
| Irradiation Time Setting | 0 to 30 minutes |
| Exhaust System | Fan with φ80 mm duct for ozone gas removal |
Typische Anwendungsbereiche
- Removal of molecular contamination from scanning probe tips and atomic force microscopy (AFM) probes.
- Surface cleaning of semiconductor wafers such as Si, Ge, GaAs before thin-film coating or lithography.
- Oxidation and curing of UV adhesives and surface sterilization.
- UV photopatterning of self-assembled monolayers (SAMs) and oxidation of PDMS surfaces.
- Cleaning and sharpening of microelectromechanical systems (MEMS) devices.
Hinweise zur Konfiguration und zum Betrieb
The PCE66H includes the quartz sample holder and built-in heating system as standard. Replacement UV lamps are available separately. The exhaust fan should be connected to an external duct to safely vent ozone gas outside the laboratory environment. The PID temperature controller allows for flexible programming of heating profiles, and built-in safety features include overheat protection and thermocouple failure alarms. Users should ensure proper ventilation and follow safety guidelines when operating UV-ozone equipment.
