OTF-1200X-RTP-4-SL Rapid Thermal Processing Tube Furnace with 4″ Quartz Tube, Sliding Rail Cooling, and Infrared Halogen Lamp Heating up to 900°C
The OTF-1200X-RTP-4-SL is engineered for rapid thermal processing tasks requiring precise temperature control and fast thermal cycling, such as chemical vapor deposition (CVD) growth of graphene and carbon nanotubes. Its design incorporates a high purity fused quartz process tube with a 4-inch outer diameter, providing a clean and inert environment suitable for vacuum and low-pressure applications.
This tube furnace utilizes infrared halogen lamps as heating elements, enabling rapid heating rates up to 50°C per second. The furnace is mounted on dual chromium-plated steel sliding rails driven by a DC motor, allowing automatic sliding over a 340 mm range to facilitate rapid cooling by moving the heated zone away from the sample. Cooling rates exceed 8°C per second between 1000°C and 600°C, supported by integrated air fans for enhanced heat dissipation.
Wichtigste Merkmale
- Maximum operating temperature of 900°C for short durations (under 1 hour), with continuous operation up to 600°C.
- Eight 1 kW halogen light tubes arranged over a 200 mm heating length for uniform infrared heating.
- PID temperature controller with 30 programmable segments, ±1°C accuracy, and built-in safety protections including over-temperature and thermocouple failure alarms.
- Vacuum-compatible stainless steel flanges with integrated digital vacuum gauge, needle valves, and KF25 valve for vacuum pump connection.
- Sliding furnace mechanism with adjustable speed (0-70 mm/s) controlled automatically by the temperature program for rapid cooling cycles.
- Two K-type thermocouples for precise temperature monitoring: one for furnace control and one positioned near the sample.
- Built-in flow meter with 16-160 ml/min range for controlled gas flow during processing.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Höchsttemperatur | 900°C (less than 1 hour), 800°C (up to 120 minutes), 600°C continuous |
| Erwärmungsgeschwindigkeit | Up to 50°C/s |
| Abkühlgeschwindigkeit | Greater than 8°C/s (1000°C to 600°C via sliding) |
| Process Tube | High purity fused quartz, 4″ OD x 94 mm ID x 1400 mm length |
| Heizelemente | 8 x 1 kW halogen light tubes (10 mm diameter, 300 mm length) |
| Sliding Rails | Dual Cr-plated steel rails, 1200 mm length, DC motor driven |
| Sliding Range and Speed | 340 mm range, 0-70 mm/s adjustable speed |
| Temperaturregelung | PID controller with 30 programmable segments, ±1°C accuracy, RS485 communication |
| Thermocouples | Two K-type, 1/4″ diameter, 24″ length; one for furnace control, one near sample |
| Vakuumfähigkeit | 10^-2 torr achievable with mechanical pump, 10^-4 torr with molecular pump (pump not included) |
| Stromversorgung | AC 208-240 V, single phase, 50/60 Hz, 9 kW |
| Gas Flow Meter | Built-in, range 16-160 ml/min |
Typische Anwendungsbereiche
This furnace is ideal for rapid thermal annealing, chemical vapor deposition of graphene and carbon nanotubes, and other thin film or material synthesis processes requiring fast temperature ramping and controlled atmosphere. It is also suitable for research on perovskite solar cell fabrication and similar advanced materials.
Hinweise zur Konfiguration und zum Betrieb
The furnace includes vacuum flanges with integrated digital vacuum gauge and needle valves for gas and vacuum control. A mechanical or molecular vacuum pump must be ordered separately. The sliding function is automatically controlled by the temperature program to enable rapid cooling cycles. Halogen lamps are consumable parts with an expected working life of approximately 2000 hours depending on usage. For safe operation, a two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI. The furnace is CE certified; additional NRTL or CSA certifications are available at extra cost.
