OTF-1200X-II-PE-RR Roll to Roll PE-CVD System with 1200°C Tube Furnace and 300W RF Plasma for Continuous 2D Film Growth on Foil or Wire
The OTF-1200X-II-PE-RR is a laboratory-scale roll to roll plasma-enhanced chemical vapor deposition (PE-CVD) system engineered for continuous synthesis of graphene and other two-dimensional films on flexible substrates such as thin foil or wire. This system addresses the need for scalable film growth by integrating a controlled substrate feeding mechanism within a high-temperature tube furnace environment.
The core of the system is an 80 mm outer diameter quartz tube furnace featuring two heating zones: a 440 mm programmable heating zone capable of reaching 1200°C for short durations and a 250 mm constant temperature zone for stable processing. The furnace is paired with a 300W radio frequency plasma source operating at 13.56 MHz to enhance chemical vapor deposition reactions. Substrate handling is facilitated by two vacuum chambers equipped with reeling rollers that allow substrate speeds from 1 to 400 mm/min and include a precision tension control mechanism to maintain substrate integrity during processing.
Wichtigste Merkmale
- Dual-zone tube furnace with max 1200°C temperature for up to 60 minutes and continuous operation at 1100°C
- 300W RF plasma source with automatic matching and ±1% power stability at 13.56 MHz frequency
- Three-channel mass flow controller gas delivery system calibrated for Argon, Hydrogen, and Methane gases
- High-quality mechanical rotary vane vacuum pump achieving vacuum pressures down to 10⁻² Torr
- 7-inch touchscreen control panel for integrated management of temperature, plasma power, and gas flow
- Optional upgrades include Eurotherm temperature controller for ±0.1°C accuracy and larger diameter quartz tubes for wider substrates
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Tube Furnace Diameter | 80 mm OD x 72 mm ID (standard), 100 mm OD x 94 mm ID (optional) |
| Heizzonen | Two zones: 440 mm programmable, 250 mm constant temperature |
| Maximaltemperatur | 1200°C (up to 60 min), 1100°C continuous |
| Temperaturregler | 30 programmable segments, ±1°C accuracy (Eurotherm optional ±0.1°C) |
| RF Plasma Power | 5-300 W adjustable, 13.56 MHz frequency, automatic matching |
| Substrate Width | Max 65 mm for 80 mm OD tube, up to 80 mm for 100 mm OD tube |
| Gas Delivery | Three channels with MFCs: 0-100 SCCM (Ar), 1-199 SCCM (H2), 1-499 SCCM (CH4) |
| Vakuumpumpe | Rotary vane pump, 7.8 CFM, max vacuum 10⁻² Torr |
| Control Interface | 7″ touchscreen panel; PC software optional |
Typische Anwendungsbereiche
This system is ideal for research and development of continuous graphene film growth and other two-dimensional materials on flexible substrates. It supports industrial process exploration for electronics, sensors, and advanced coatings requiring uniform thin films on wires or foils.
Hinweise zur Konfiguration und zum Betrieb
The system includes one roll of copper foil (65 mm width, 0.025 mm thickness) for initial practice. Optional upgrades include larger diameter tubes for wider substrates, oil-less vacuum pumps, and advanced temperature controllers. Safety features include over-temperature protection and gas leak alarms for hydrogen and methane. Proper installation of gas sensors near the furnace is recommended to ensure safe operation.
