GSL-1800X-ZF4 Four-Source High Vacuum Thermal Evaporation Coater
The GSL-1800X-ZF4 is engineered for the deposition of thin films on oxygen-sensitive metallic materials such as titanium, aluminum, and gold. Its design supports precise layer-by-layer coating inside a high vacuum environment, essential for applications requiring contamination-free and uniform thin films. The system’s vacuum chamber has been enlarged since May 2023 to facilitate easier sample loading and accommodate larger substrates.
This coater employs four tungsten heating boats as evaporation sources, each equipped with water-cooled shrouds to maintain stable operation. The stainless steel vacuum chamber measures 300 mm in internal diameter and 360 mm in height, featuring an electropolished finish and a 100 mm observation window. The chamber achieves vacuum levels down to 10-6 torr using a turbo molecular pump (optional) backed by a mechanical pump, ensuring high purity deposition conditions.
Wichtigste Merkmale
- Four tungsten evaporation sources with motorized shutters for controlled layer deposition.
- Large 300 mm diameter stainless steel vacuum chamber with hinged front door for easy sample access.
- Vacuum capability down to 5.0×10-6 Torr with optional turbo molecular pump and mechanical backing pump.
- Rotary sample holder with 120 mm diameter and adjustable evaporation distance (140-200 mm).
- Optional sample stage heating up to 500 °C for enhanced film properties.
- Integrated control unit managing vacuum, power, and thickness with optional quartz crystal microbalance for thickness monitoring.
- Multiple ports (ISO, KF, CF) for vacuum connections and accessories such as film thickness monitors.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Leistungsaufnahme | 208 – 240 VAC, 30 A, 50/60 Hz, single phase |
| Power Output | 0 – 8 VAC max., 200 A max., 1600 W max. |
| Vacuum Chamber | 300 mm ID x 360 mm height, electropolished stainless steel |
| Sichtfenster | 100 mm diameter |
| Vakuumanschlüsse | One ISO-100K, one KF16, one KF40, six CF35 ports |
| Vacuum Pump (Optional) | 260 L/s turbo molecular pump; backing mechanical pump required |
| Vakuumniveau | 5.0×10-6 Torr after 40 min pumping; ultimate 5.0×10-7 Torr after bake out |
| Evaporation Sources | Four tungsten heating boats with water-cooled shrouds (70L x 12W x 3H mm) |
| Sample Holder | Rotary, 120 mm diameter; evaporation distance 140-200 mm |
| Sample Stage Heating (Optional) | Up to 500 °C |
| Thickness Measurement (Optional) | Quartz crystal microbalance with 1.0 Å accuracy |
| Steuereinheit | Integrated vacuum, thickness, and power control |
| Chilled Water (Optional) | 30-60 psig, 15-25 °C recommended with recirculating chiller |
Typische Anwendungsbereiche
This coater is ideal for research and development of thin films involving oxygen-sensitive metals and other materials requiring high vacuum thermal evaporation. It supports multilayer coatings for electronics, optics, and surface engineering applications where precise thickness control and contamination-free deposition are critical.
Hinweise zur Konfiguration und zum Betrieb
The system includes motorized shutters for each evaporation source to enable controlled deposition sequences. Optional accessories include a quartz crystal microbalance for real-time thickness monitoring and a heated sample stage for substrate temperature control. A mechanical backing pump is necessary to achieve initial vacuum levels before turbo pump operation. Proper chilled water supply is recommended to maintain source cooling. Safety precautions should be observed when handling high vacuum and high temperature components.
