VTC-EV3-GB Thermal Evaporation Coater in Glovebox for 4″ Wafers with 3 Crucibles and Precision Temperature Control
The VTC-EV3-GB system is engineered for precise thermal evaporation coating of thin films on 4-inch wafers, particularly suited for air-sensitive materials handled within a glovebox environment. This setup enables sequential deposition of multilayer metallic or organic films by utilizing three separate evaporation sources housed in a quartz vacuum chamber integrated at the glovebox base. The controlled atmosphere maintains oxygen and humidity levels below 1 ppm, essential for sensitive film growth.
The system features alumina crucibles heated by tungsten coil heaters capable of reaching temperatures from 200 ºC up to 1700 ºC, monitored by B-type thermocouples with ±1 ºC precision. A digital temperature controller supports up to 30 programmable segments, allowing fine-tuned thermal profiles for each evaporation source. The rotatable sample holder accommodates 4″ wafers, with adjustable height and rotation speed of 5 rpm to ensure uniform film thickness across the substrate.
Wichtigste Merkmale
- Integrated quartz vacuum chamber (280 mm OD, 260 mm ID, 310 mm length) within glovebox for air-sensitive processing.
- Three alumina crucibles with tungsten coil heaters enable multilayer film deposition sequentially in one chamber.
- Temperature control from 200 ºC to 1700 ºC with ±1 ºC accuracy and 30 programmable segments.
- 4″ diameter rotatable sample holder with adjustable height (up to 90 mm) and 5 rpm rotation speed for uniform coating.
- Optional high vacuum capability down to 1.0E-5 Torr using turbomolecular pump.
- Built-in gas inlet with needle valve for chamber purging or forming gas processing.
- Optional quartz film thickness monitor for in-situ measurement with accuracy up to 1 Å.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Vacuum Chamber Dimensions | Outer Diameter 280 mm, Inner Diameter 260 mm, Length 310 mm |
| Sample Holder Diameter | 4 inches (rotatable) |
| Sample Holder Height Adjustment | Up to 90 mm |
| Sample Rotation Speed | 5 rpm |
| Evaporation Sources | 3 alumina crucibles with tungsten coil heaters |
| Temperaturbereich | 200 ºC to 1700 ºC |
| Genauigkeit der Temperaturregelung | ±1 ºC |
| Temperaturregler | Digital, 30 programmable segments |
| Thermocouples | 3 B-type thermocouples (one per crucible) |
| Vakuumfähigkeit | Up to 1.0E-5 Torr with optional turbopump |
| Power Supply (Coater) | AC 110 V, 50/60 Hz, 1200 W input power |
| Power Supply (Glovebox) | AC 110 V, 50/60 Hz, 1500 W input power |
| Gaseinlass | 1/4″ tube fitting with needle valve |
Typische Anwendungsbereiche
This system is ideal for depositing multilayer thin films of metals and organic materials on 4-inch wafers, especially when working with air-sensitive compounds requiring an inert glovebox atmosphere. It supports research and development in semiconductor device fabrication, organic electronics, and thin film coatings where precise temperature control and vacuum conditions are critical.
Hinweise zur Konfiguration und zum Betrieb
The system includes three alumina crucibles with tungsten coil heaters and B-type thermocouples installed for individual temperature monitoring. The quartz vacuum chamber is integrated into the glovebox base to maintain an inert atmosphere. A vacuum pump is required and can be selected from options including a double-stage rotary vane pump or a turbomolecular pump for higher vacuum levels. Optional accessories include additional alumina crucibles, tungsten coil heaters, and a quartz film thickness monitor for in-situ measurement. Temperature ramp rates should be limited to 0.3 ºC/s below 1200 ºC and 0.15 ºC/s between 1200 ºC and 1700 ºC to ensure system stability and coating quality.
