GSL-1700X-SPC2 Thermal Evaporating Coater with Precision Programmable Temperature Control and Rotary Sample Holder for Uniform Film Deposition
The GSL-1700X-SPC2 is engineered for laboratory-scale thermal evaporation coating tasks requiring precise temperature regulation and uniform film deposition. It accommodates metallic and organic materials, enabling film formation up to 2 inches in size within a controlled vacuum environment. This system is ideal for applications demanding stable, programmable heating and consistent coating thickness.
The coater integrates a 6-inch outer diameter quartz vacuum chamber with a 2-inch diameter rotary sample holder that rotates at 5 rpm to ensure even film coverage. Temperature control is achieved via a tungsten coil heater and alumina crucible, capable of reaching temperatures from 200 ºC up to 1700 ºC with ±1 ºC stability, programmable in 30 segments. High vacuum conditions below 1.0E-5 Torr can be attained using an optional turbomolecular pump, critical for high-purity film deposition.
Wichtigste Merkmale
- Quartz vacuum chamber (6″ OD x 10″ H) designed for easy cleaning and durability.
- Ø2″ rotary sample holder with mechanical shutter for uniform film coating at 5 rpm.
- Tungsten coil filament heater and alumina crucible support evaporation temperatures up to 1700 ºC.
- Precision PID programmable temperature control with 30 segments and ±1 ºC stability.
- Optional quartz crystal microbalance (QCM) for real-time film thickness and deposition rate monitoring.
- Built-in gas inlet with needle valve for chamber purge and venting.
- Vacuum capability enhanced by optional turbopump achieving <1.0E-5 Torr for sensitive material evaporation.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 208-240 VAC, 50/60 Hz, single phase, 500 VA (110 VAC available with 750 W transformer) |
| Precursor Heater | Tungsten coil filament with alumina crucible; B-type thermocouple |
| Temperaturregelung | Manual current control & PID programmable; 30 segments; ±1 ºC stability; heating rate <0.3 ºC/s below 1200 ºC, <0.15 ºC/s from 1200-1700 ºC |
| Sample Holder | Ø50 mm rotary stage with mechanical shutter; 5 rpm rotation; stroke length 40-85 mm |
| Vacuum Chamber | Quartz; O.D. 165 mm; I.D. 150 mm; Length 250 mm |
| Vakuumfähigkeit | Optional turbopump achieves <1.0E-5 Torr; KF25 vacuum port; dual-stage rotary vane pump recommended |
| Pressure Gauge | Anti-corrosive capacitance diaphragm gauge, 3E-5 Torr to atmospheric pressure |
| Gaseinlass | Built-in 1/4″ tube fitting with needle valve for chamber purge and vent |
| Film Thickness Monitor (Optional) | Quartz crystal microbalance (QCM) with 0.10 Å resolution and PC software readout |
Typische Anwendungsbereiche
Ideal for depositing thin films of metals and organic compounds in research and development laboratories. Suitable for multilayer film growth by sequential evaporation of different materials using up to four crucibles. Compatible with glove box integration for handling oxygen- and moisture-sensitive materials such as lithium metal.
Hinweise zur Konfiguration und zum Betrieb
The system includes a quartz chamber, alumina crucibles, tungsten coil heater, and an anti-corrosive capacitance diaphragm gauge. A vacuum pump is required but not included; a turbomolecular pump is highly recommended for high vacuum operation. The optional QCM sensor provides real-time monitoring of film thickness and deposition rate.
Users should avoid starting heating without vacuum and enclosed chamber conditions. Vacuum must be maintained during evaporation and cooling until the temperature falls below 100 ºC. The chamber can be purged or vented via the built-in gas inlet and needle valve. Cleaning with isopropyl alcohol and baking the chamber prior to use improves vacuum quality.
