RF-300I-LD Compact 300W 13.56 MHz RF Generator with Integrated Auto Matching Network for DIY RF Sputtering
The RF-300I-LD is engineered to facilitate small-scale radio frequency (RF) sputtering processes, ideal for laboratory or DIY thin film coating setups. It integrates a 13.56 MHz RF power generator with an automatic matching network into a single compact unit, simplifying installation and operation for users working with magnetron sputtering sources.
This generator supports adjustable output power ranging from 5 to 300 watts, maintaining a tight ±1% stability to ensure consistent sputtering performance. The device operates on a selectable input voltage of 110 to 240 VAC at 50/60 Hz, featuring air cooling to maintain optimal thermal conditions and a noise level below 50 dB for quieter laboratory environments.
Wichtigste Merkmale
- Integrated 13.56 MHz RF generator and automatic matching network in one compact unit.
- Output power adjustable from 5 to 300 W with ±1% stability for precise control.
- Selectable input power: 110 VAC or 220 VAC at 50/60 Hz for flexible installation.
- Automatic impedance matching using a variable air capacitor to optimize power transfer.
- Air-cooled design ensures reliable operation without additional cooling systems.
- Low operational noise level under 50 dB suitable for laboratory settings.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| RF Frequency | 13.56 MHz ±0.005% |
| Output Power | 5 to 300 W adjustable |
| Power Stability | ±1% |
| Eingangsspannung | Selectable 110 VAC or 220 VAC, 50/60 Hz |
| Max Current | 1.5 A |
| Cooling Method | Air cooling |
| Geräuschpegel | Less than 50 dB |
| Matching Network | Automatic with variable air capacitor |
Typische Anwendungsbereiche
The RF-300I-LD is suitable for use in laboratory-scale magnetron sputtering systems, particularly for DIY thin film coating projects requiring precise RF power control. It can be paired with 2″ high vacuum magnetron sputtering sources to fabricate thin films for research and development in materials science, electronics, and surface engineering.
Hinweise zur Konfiguration und zum Betrieb
Optional accessories include a 2″ high vacuum magnetron sputter source compatible with this RF generator, a high vacuum quick disconnect for mounting sputtering tools onto vacuum chambers, and a digital temperature-controlled circulating water chiller for enhanced thermal management. A recommended 148 cm RF cable is available separately to connect the generator to sputtering sources. Users should ensure proper ventilation for air cooling and verify input voltage selection before operation.
