OTF-1200X-4-C4-SL-UL Dual Tube (100/80 mm) CVD Sliding Furnace with 4-Channel Gas and Vacuum System
The OTF-1200X-4-C4-SL-UL is engineered for advanced chemical vapor deposition (CVD) processes, specifically targeting thin film coatings on metallic foils such as flexible electrodes used in next-generation energy applications. This system addresses the challenge of uniform thin film deposition on curved foil substrates by utilizing a dual quartz tube configuration where the metal foil is wrapped around the interior tube surface, enabling controlled reaction conditions within the annular space between tubes.
This furnace incorporates a sliding mechanism that allows the heating zone to move smoothly along rails, facilitating rapid heating and cooling cycles essential for process optimization and throughput. The design supports either a single or dual heating zone configuration, with precise temperature control and uniformity ensured by a high-purity alumina insulation chamber and integrated cooling fans for ventilation.
Wichtigste Merkmale
- Dual quartz tube assembly: 100 mm outer diameter and 80 mm inner diameter tubes, with the metallic foil wrapped on the inner tube for CVD reactions.
- Sliding furnace on dual-direction rails enables fast thermal cycling by moving the heating zone relative to the sample.
- Four independent digital mass flow controllers (MFCs) managing gas flow rates across four channels with ranges from 0–100 SCCM to 0–500 SCCM and ±1% full scale accuracy.
- Integrated vacuum system includes a mechanical rotary vane pump with KF25 adapter; optional turbomolecular pump available for ultra-high vacuum down to 10^-5 torr.
- Heating zones: Single zone with 440 mm length or dual zones each 200 mm long, with constant temperature zones and up to 500°C differential capability.
- PID temperature controller with 30 programmable segments, ±1°C accuracy, over-temperature protection, and RS485 communication port.
- Stainless steel sliding flange assembly with water-cooled vacuum flanges and needle valves for precise gas and vacuum management.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Furnace Structure | Single or Dual Heating Zone |
| Heating Zone Length | Single: 440 mm; Dual: 2 × 200 mm (400 mm total) |
| Konstanttemperaturzone | Single: 120 mm ±1°C; Dual: 250 mm at same temperature |
| Höchsttemperatur | 1200°C (max), 1100°C continuous |
| Stromversorgung | Single Zone: 208-240 VAC, 50/60 Hz, 2.5 kW; Dual Zone: 208-240 VAC, 50/60 Hz, 4 kW |
| Quartz Tubes | Outer: OD 100 mm × ID 96 mm × 1400 mm length; Inner: OD 80 mm × ID 75 mm × 1800 mm length |
| Gas Flow Control | 4 Digital MFCs: 0–100, 0–200, 0–200, 0–500 SCCM ranges; ±1% FS accuracy |
| Vacuum Pressure | 10^-2 torr (mechanical pump), 10^-5 torr (optional turbopump) |
| Temperaturregler | PID with 30 programmable segments, ±1°C accuracy, over-temp alarm, RS485 port |
| Kühlung | Cooling fans at furnace base; water-cooled flanges and needle valves |
Typische Anwendungsbereiche
This furnace is optimized for chemical vapor deposition of thin films on flexible metallic foils, such as graphene growth substrates and flexible electrodes used in energy storage and conversion research. It supports roll-to-roll style processing by enabling uniform coating on foil wrapped around the inner tube surface, suitable for advanced battery, supercapacitor, and flexible electronics development.
Hinweise zur Konfiguration und zum Betrieb
The system includes a sliding rail and clamp for secure positioning during operation. Users can select between single or dual heating zones and choose between a high-speed oilless dry vacuum pump or a two-stage mechanical pump. The vacuum flanges feature water cooling and needle valves for precise gas and vacuum control. Temperature controllers can be optionally upgraded to Eurotherm 3504 for LabVIEW compatibility or enhanced software control packages.
Proper electrical installation by a licensed electrician is required due to the power specifications. Calibration of temperature and heating/cooling rates under working conditions is recommended before use to ensure process accuracy.
