OTF-1200X-RTP-5S 1200°C Max 5-Inch Sliding Tube Furnace for Rapid Thermal Processing
The OTF-1200X-RTP-5S is engineered for rapid thermal processing tasks requiring precise temperature control and fast thermal cycling. It accommodates wafers up to 4 inches in diameter within a 5-inch diameter quartz tube, making it suitable for semiconductor annealing and other high-temperature material treatments under vacuum or low-pressure conditions.
This furnace employs resistance heating combined with an electric sliding motor that enables rapid heating and cooling by moving the heated zone relative to the sample. The system achieves maximum temperatures of 1200°C with heating and cooling rates up to 2°C per second and 4°C per second, respectively. The furnace structure includes a double-layer steel casing with air cooling to maintain safe external temperatures.
Wichtigste Merkmale
- 5″ quartz tube (130mm O.D x 120mm I.D x 1100mm length) with airtight stainless steel vacuum flanges.
- Dual sliding rails with a 450mm sliding range; optional automatic sliding motor controlled by temperature controller for rapid cooling.
- Maximum operating temperature of 1200°C (up to 0.5 hours) and continuous operation up to 1100°C.
- Two PID temperature controllers with 30 programmable segments, ±1°C accuracy, and built-in safety protections.
- Vacuum capability down to 10^-5 torr with appropriate pumps (not included).
- Separate temperature control unit for remote operation and RS485 communication port for PC control via included MTS-02 module.
- Air-cooled double-layer steel casing maintaining furnace shell temperature ≤60°C.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Modell | OTF-1200X-RTP-5S |
| Höchsttemperatur | 1200°C (up to 0.5 hours) |
| Continuous Operating Temperature | 1100°C or less |
| Heating Zone Length | 300 mm |
| Konstanttemperaturzone | 100 mm ±3°C |
| Quartz Tube Dimensions | 130 mm O.D x 120 mm I.D x 1100 mm length |
| Sample Capacity | Wafers up to 4″ diameter |
| Stromversorgung | AC 208-240V, Single Phase, 50/60 Hz, 3 kW |
| Erwärmungsgeschwindigkeit | Up to 2°C/s (recommended ≤ 20°C/min for element protection) |
| Abkühlgeschwindigkeit | Up to 4°C/s via sliding and air cooling |
| Sliding Rails | Dual Cr-plated steel rails, 1200 mm length, 450 mm sliding range |
| Temperaturregler | Two PID controllers, 30 programmable segments, ±1°C accuracy, overheating and thermocouple break protection |
| Vakuumfähigkeit | Down to 10^-5 torr with molecular pump (pump not included) |
| Communication | RS485 port, PC control via MTS-02 module included |
Typische Anwendungsbereiche
Ideal for rapid thermal annealing of semiconductor wafers, thin film processing, and materials research requiring precise temperature cycling under vacuum or low-pressure atmospheres.
Hinweise zur Konfiguration und zum Betrieb
The furnace includes a 5″ quartz tube with airtight flanges and vacuum ports equipped with pressure gauges and stop valves. Vacuum pumps are not included and must be ordered separately to achieve desired vacuum levels. An optional automatic sliding motor controlled by the temperature controller can be added to enable programmed sliding for rapid cooling. Safe operation under vacuum requires a two-stage pressure regulator on gas cylinders limiting pressure below 3 PSI. The furnace shell is air-cooled to maintain external temperature below 60°C. PC control is enabled via the included MTS-02 module; a compatible laptop can be supplied optionally to facilitate software installation and testing.
