EQ-MFC100A Computerized Digital Mass Flow Controller for Precise Gas Flow Control up to 1000 SCCM
The EQ-MFC100A is engineered to deliver accurate and reliable control of gas flow rates in laboratory and research environments, particularly suited for chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), and graphene furnace systems. This digital mass flow controller enables precise regulation of gases at high pressure, facilitating consistent process conditions essential for material synthesis and experimental reproducibility.
Unlike controllers with integrated displays, the EQ-MFC100A is designed for computer-based operation via dedicated manufacturer software, allowing remote and automated control. Its digital communication interfaces support RS485 and DeviceNet protocols, alongside analog signal compatibility, ensuring flexible integration with various gas control systems.
Wichtigste Merkmale
- Full scale flow range options including 100, 200, 500, and 1000 SCCM for nitrogen, with customizable ranges available.
- High accuracy with ±1.0% set point tolerance above 35% full scale and ±0.35% full scale at 35% flow.
- Fast response time of 1 second or less for dynamic process adjustments.
- Normally closed or normally open valve rest positions to suit system requirements.
- Robust operation temperature up to 545°C, suitable for demanding furnace environments.
- Multiple communication interfaces: digital RS485, DeviceNet, and analog 0-5 VDC or 4-20 mA signals.
- Leak integrity rated at 1×10⁻⁹ atm·cc/sec helium, ensuring minimal gas loss and contamination.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Full Scale Range (N2) | 100, 200, 500, 1000 SCCM (customizable) |
| Accuracy | ±1.0% S.P. (≥35% F.S.), ±0.35% F.S. (at 35% F.S.) |
| Repeatability | ±0.2% F.S. |
| Linearity | ±0.5% F.S. |
| Response Time | ≤1 second |
| Valve Rest Position | Normally Closed or Normally Open |
| Temperature Coefficient | Zero: ≤±0.05% F.S.; Span: ≤±0.1% F.S. (≤30 SLM), ≤±0.2% F.S. (>30 SLM) |
| Zero Drift | 0.6% F.S. per year without auto-zero |
| Surface Finish (Ra) | 25 Ra |
| Operating Temperature | Up to 545°C |
| Communication Interfaces (Input/Output) | Digital: RS485, DeviceNet; Analog: 0-5 VDC or 4-20 mA |
| Stromversorgung | ±11 to ±16 VDC or +11 to +28 VDC (400 mA) |
| Electronic Connector | D-sub 9 pins male, D-sub 15 pins male, DeviceNet male |
| Differential Pressure | 0.05–0.35 MPa (≤10000 SCCM) |
| Maximaler Druck | 3 MPa |
| Leak Integrity | 1×10⁻⁹ atm·cc/sec He |
| Seal Materials | Viton, Neoprene |
| Fittings | Swagelok 1/4” |
Typische Anwendungsbereiche
The EQ-MFC100A is ideal for precise gas flow control in CVD and PECVD processes, graphene synthesis, and other gas mixture applications requiring stable and accurate flow rates under high pressure conditions.
Hinweise zur Konfiguration und zum Betrieb
This mass flow controller is designed without an integrated display and requires connection to a computer running the manufacturer’s control software. It includes standard DB15 pin connectors and Swagelok 1/4” fittings for seamless integration with compatible furnaces. Optional custom flow ranges are available upon request. Users should ensure proper electrical supply within specified voltage ranges and verify valve rest position suitability for their system.
