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MFC-7B Nitrogen-Calibrated Mass Flow Controller up to 5000 sccm for Gas Flow Regulation in CVD/PECVD Systems

Designed for precise gas flow control in chemical vapor deposition and graphene furnace applications.
Calibrated for nitrogen with options for other gases via conversion factors.
Supports flow rates up to 5000 sccm with ±1.5% full scale accuracy.
Equipped with a D-sub 15 pin connector and Swagelok 1/4" fittings for integration.

Konformität: CE-zertifiziert
Maßgeschneidert: OEM/ODM
Verpackung: Sperrholzkiste

Produkte

MFC-7B Nitrogen-Calibrated Mass Flow Controller up to 5000 sccm for Gas Flow Regulation in CVD/PECVD Systems

The MFC-7B is engineered to provide accurate and reliable control of gas flow rates in laboratory chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), and graphene furnace processes. It is primarily calibrated for nitrogen gas, ensuring precise flow regulation essential for research and development applications involving gas mixtures and vacuum coating techniques.

This mass flow controller is designed as a replacement component compatible with MTI multiple channel gas control systems. It features a normally closed valve configuration and supports flow rates up to 5000 standard cubic centimeters per minute (sccm) of nitrogen. The device operates with a differential pressure range of 0.1 to 0.5 MPa and can withstand a maximum pressure of 3 MPa, making it suitable for various controlled atmosphere environments.

Wichtigste Merkmale

  • Calibrated for nitrogen with ±1.5% full scale accuracy and ±0.2% repeatability.
  • Flow range options include 100, 200, 500, 1000, 2000, and 5000 sccm; custom ranges available on request.
  • Response time of 10 seconds or less for rapid flow adjustments.
  • Standard D-sub 15 pin male electronic connector for seamless integration.
  • Swagelok 1/4″ fittings compatible with MTI furnace gas delivery systems.
  • Valve is normally closed to ensure safety and controlled gas delivery.
  • Seals made from Viton and Neoprene for chemical resistance and durability.

Technische Daten

Parameter Spezifikation
Full Scale Range (N2) 100, 200, 500, 1000, 2000, 5000 sccm (custom ranges available)
Accuracy ±1.5% Full Scale
Repeatability ±0.2% Full Scale
Linearity ±1% Vollausschlag
Response Time ≤10 seconds
Valve Configuration Normally Closed
Operating Temperature Up to 545°C
Input Signal 0-5 VDC
Output Signal 0-5 VDC
Stromversorgung +15 V 50 mA; -15 V 200 mA
Electronic Connector D-sub 15 pins male
Differential Pressure Range 0.1 to 0.5 MPa
Maximaler Druck 3 MPa
Leak Integrity 1×10⁻⁸ atm·cc/sec He
Seal Materials Viton, Neoprene
Fittings Swagelok 1/4″

Typische Anwendungsbereiche

The MFC-7B is ideal for regulating gas flow in vacuum coating processes, CVD and PECVD reactors, and graphene furnace systems where precise gas mixture control is critical. It is used extensively in research environments requiring stable and repeatable gas delivery.

Hinweise zur Konfiguration und zum Betrieb

This model is supplied without a display and intended as a replacement part for MTI gas mixing and delivery systems. To operate the MFC-7B independently, an additional MFC-COM controller interface must be ordered separately. Calibration for gases other than nitrogen can be approximated using conversion factors provided by the manufacturer or requested as a custom calibration with extended lead time.

Produktbezogene Informationen

MSKAFAI laboratory product view 1
MSK-SFM-14-IV laboratory product view 1
OTF-1200X-III-HPCVD-S3 laboratory product view 1
MSK-SFM-500D-LD_01
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