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OTF1200XSDFPESL 1200°C Dual Sliding Tube Furnace System with 2″ Quartz Tubes and Flanges for PECVD Applications

Designed for plasma enhanced chemical vapor deposition (PECVD) processes requiring precise thermal control.
Features two sliding 2" OD quartz tube furnaces on rails for flexible positioning during deposition and evaporation.
Maximum operating temperature of 1200°C with rapid heating and cooling rates enabled by sliding mechanism.
Includes PID temperature controllers, vacuum flanges, and a 5-300W plasma RF generator for enhanced process control.

Konformität: CE-zertifiziert
Maßgeschneidert: OEM/ODM
Verpackung: Sperrholzkiste

Produkte

OTF1200XSDFPESL 1200°C Dual Sliding Tube Furnace System with 2″ Quartz Tubes and Flanges for PECVD Applications

The OTF1200XSDFPESL is engineered to meet the demanding requirements of plasma enhanced chemical vapor deposition (PECVD) processes, where precise temperature control and flexible sample positioning are critical. This system integrates two independently controlled tube furnaces mounted on a sliding rail, allowing users to manually shift the heating zones along a 400 mm travel path. This design facilitates rapid heating and cooling cycles by preheating one side of the tube and sliding the furnace to the other, achieving heating and cooling rates up to 100°C per minute.

Each furnace features a double-layer steel construction with a maximum working temperature of 1200°C (sustained up to 1100°C continuously) and a 200 mm heating zone complemented by a 60 mm constant temperature zone with ±1°C stability between 400°C and 1200°C. The system includes high purity fused quartz tubes (50 mm outer diameter, 44 mm inner diameter, 1500 mm length) with vacuum flanges installed for immediate integration into vacuum or low-pressure environments. An optional high-temperature alloy tube is available for applications requiring pressures up to 100 PSI.

Wichtigste Merkmale

  • Dual sliding tube furnaces on Cr-plated steel rails with 400 mm manual travel for flexible sample positioning and rapid thermal cycling.
  • Maximum temperature of 1200°C with PID automatic control and 30 programmable segments for precise heating, cooling, and dwell times.
  • Integrated vacuum flanges compatible with PECVD setups; optional KF25 vacuum port and digital vacuum gauge available.
  • 5-300W adjustable plasma RF generator operating at 13.56 MHz with automatic matching and air cooling for plasma-enhanced processes.
  • Heating and cooling rates vary by temperature range, with peak rates of 15°C/sec during initial heating and cooling phases.
  • Two K-type thermocouples included for accurate temperature monitoring; temperature accuracy ±1°C.
  • Optional motorized sliding, gas mixing/delivery systems, water chillers, and vacuum pumps available to enhance system capabilities.

Technische Daten

Parameter Spezifikation
Maximale Betriebstemperatur 1200°C (up to 1 hour), Continuous 1100°C
Heating Zone Length (each furnace) 200 mm
Constant Temperature Zone Length 60 mm (±1°C @ 400-1200°C)
Heating Rates Up to 15°C/sec (RT to 150°C), decreasing at higher temps
Cooling Rates Up to 15°C/sec (1000 to 950°C), decreasing at lower temps
Tube Size Quartz: 50 mm OD x 44 mm ID x 1500 mm length; Optional alloy tube for 100 PSI max pressure
Stromversorgung AC 120 VAC or 208-240 VAC, Single Phase, 50/60 Hz, 20 A breaker required
Gesamtstromverbrauch 2.5 kW
Plasma RF Generator Output 5-300 W adjustable, 13.56 MHz ±0.005%, automatic matching
Temperaturregelung PID with 30 programmable segments, built-in over-temperature protection
Sliding Rail Length 1200 mm total travel, Cr-plated steel

Typische Anwendungsbereiche

Ideal for PECVD processes requiring controlled deposition of thin films via plasma-enhanced chemical reactions under vacuum or low-pressure conditions. Suitable for thermal evaporation, sublimation, and film deposition on substrates within the quartz tube environment.

Also applicable in research and development settings where rapid thermal cycling and precise temperature uniformity are necessary for material synthesis and coating processes.

Hinweise zur Konfiguration und zum Betrieb

The system includes vacuum flanges for immediate use; optional KF25 vacuum ports with digital gauges and water-cooled flanges are available. Motorized sliding rails and multi-channel gas mixing/delivery systems can be added to enhance automation and process control.

Users must install a two-stage pressure regulator on gas cylinders to maintain pressure below 3 PSI for safe operation. Gas flow rates should be limited to under 200 SCCM to minimize thermal shock to the quartz tube.

Fast cooling is achieved by sliding the furnace away from the sample; operators should wear appropriate heat-resistant protective gear and avoid contact with hot surfaces.

Produktbezogene Informationen

OTF-1200X-4-C4-SL-UL laboratory product view 1
OTF-1200X-VT-III-4 laboratory product view 1
VBF-600S laboratory product view 1
HVHP-50 laboratory product view 1
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