OTF-1200X-III-HPCVD-S3 Three-Zone 1200°C Hybrid PVD/CVD Tube Furnace with Triple-Channel Source Feeding for Multilayer 2D Material Growth
The OTF-1200X-III-HPCVD-S3 is engineered to address the complex demands of synthesizing multilayer two-dimensional materials and thin-film structures through a hybrid physical and chemical vapor deposition process. Its design incorporates a three-zone split tube furnace that enables independent temperature control across three 300 mm heating zones, facilitating precise temperature gradients essential for controlled material growth.
This system integrates a triple-channel source feeding mechanism capable of holding up to three evaporation crucibles. It supports both sequential and simultaneous evaporation, allowing versatile deposition strategies. The furnace can operate continuously at temperatures up to 1100°C, with the capability to reach 1200°C for short durations, accommodating a range of processing requirements.
Wichtigste Merkmale
- Three independently programmable heating zones, each 300 mm in length, for precise temperature gradient control.
- Triple-channel source feeding system with stepper motor-driven quartz tube movement for controlled evaporation of up to three crucibles.
- PLC touchscreen interface for real-time source feeding control and temperature monitoring.
- Programmable digital temperature controllers with ±1°C accuracy and up to 30 programmable segments for heating, cooling, and dwell cycles.
- Double-layer steel casing with air cooling to maintain exterior temperatures below 60°C during operation.
- High-purity fibrous alumina insulation and refractory coatings to enhance energy efficiency and extend service life.
- Integrated vacuum system with double-stage rotary vane pump achieving approximately 1 × 10⁻² Torr vacuum level; optional turbomolecular pump available.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Modell | OTF-1200X-III-HPCVD-S3 |
| Furnace Structure | Three-zone split tube furnace with independent heating zones |
| Heating Zones Length | 300 mm each |
| Operating Temperature | 100–1100°C continuous; up to 1200°C short-duration (less than 1 hour) |
| Maximum Heating Rate | ≤ 10°C/min |
| Temperaturregelung | Three programmable digital controllers, ±1°C accuracy, up to 30 segments, PID control |
| Source Feeding System | Triple-channel with stepper motor-driven quartz tube movement; supports up to three crucibles (18×18 mm) |
| Crucible Travel Distance | 300 mm |
| Heizelemente | Molybdenum-doped Fe-Cr-Al alloy |
| Processing Tubes | One fused quartz tube (130 mm OD × 122 mm ID × 1200 mm L) and three quartz tubes (25 mm OD × 21 mm ID × 1200 mm L) |
| Vacuum System | Double-stage rotary vane pump (~1 × 10⁻² Torr); optional turbomolecular pump available |
| Stromversorgung | 208–240 VAC, single phase, 50/60 Hz; 10 kW rated power; 70 A circuit breaker required |
| Gas Flow Control | Four-channel system with independent inlet and flow control for each source channel |
Typische Anwendungsbereiche
- Hybrid PVD/CVD thin-film deposition for research and development of multilayer 2D materials.
- Sequential evaporation and co-deposition experiments involving up to three source materials.
- Temperature-gradient-assisted material growth under controlled atmosphere conditions.
- Fabrication of advanced thin films requiring precise temperature and source control.
Hinweise zur Konfiguration und zum Betrieb
The system includes a PLC touchscreen interface for source feeding and temperature monitoring. Crucible movement is stepper motor-driven with quartz tube positioning, but handwheel control is also referenced; confirm configuration before ordering. The furnace features a split-cover safety interlock that cuts heating power when opened during operation. Optional Eurotherm controllers with higher accuracy and turbomolecular vacuum pumps are available at additional cost. Verify thermocouple quantity and exact controller configuration as some specifications differ.
Maße & Versand
| Product dimensions | 4000 mm (L) × 600 mm (W) × 1500 mm (H). |
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