OTF-1200X-IV-S Four-Zone 1200°C Tube Furnace with Independent Temperature Controllers for 1-2″ Tubes
The OTF-1200X-IV-S is engineered for laboratory processes that demand precise thermal gradients or uniform heating within a compact tube furnace setup. It accommodates processing tubes with outer diameters of 1 to 2 inches and a minimum length of 1000 mm, making it suitable for various chemical vapor deposition (CVD), physical vapor deposition (PVD), and crystal growth techniques such as PVT and CVT. This furnace enables controlled temperature profiles along the tube length by independently adjusting four heating zones.
Each of the four heating zones spans 100 mm, combining for a total heated length of 400 mm. The furnace can maintain a uniform temperature zone up to 250 mm long with ±1°C stability when all zones are set identically. The maximum temperature difference between adjacent zones can reach 200°C, allowing creation of stepwise thermal gradients. The maximum operating temperature is 1200°C for short durations (under 1 hour) and 1100°C for continuous operation.
Wichtigste Merkmale
- Four independent heating zones with separate digital PID temperature controllers.
- Heating chamber length of 400 mm with built-in K-type thermocouples for precise monitoring.
- Heating elements made from 1300°C grade Fe-Cr-Al alloy doped with molybdenum for durability.
- Double-layer steel casing with air cooling to keep external surface temperature below 60°C.
- Flexible installation: heating module can be positioned horizontally or vertically (vertical mounting requires user-supplied support).
- Power supply: AC 110V single phase, 50/60 Hz, 30 A; 3 kW max power consumption.
- RS485 communication port available; optional software and touchscreen controller for remote operation.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Maximale Betriebstemperatur | 1200°C (up to 1 hour), 1100°C continuous |
| Heizzonen | 4 zones, each 100 mm length |
| Total Heating Length | 400 mm |
| Max Uniform Zone Length | 250 mm ±1°C |
| Maximale Temperaturdifferenz zwischen den Zonen | 200 °C |
| Heating Element Material | Fe-Cr-Al alloy doped with Mo (1300°C grade) |
| Isolierung | High purity fibrous alumina |
| Temperature Controllers | Four digital PID controllers with ±1°C accuracy, built-in thermocouple protection |
| Thermocouples | Four K-type, one per zone |
| Stromversorgung | AC 110V, 50/60 Hz, 30 A (3 kW max) |
| Kühlung | Air cooled double-layer steel case |
| Tube Compatibility | 1″ or 2″ OD tubes, minimum 1000 mm length |
| Kommunikationsschnittstelle | RS485 port; optional remote software and touchscreen controller |
Typische Anwendungsbereiche
This furnace is well suited for chemical vapor deposition (CVD), physical vapor deposition (PVD), and crystal growth methods such as physical vapor transport (PVT) and chemical vapor transport (CVT). It enables precise thermal gradients or uniform heating profiles essential for thin film deposition, material synthesis, and semiconductor research.
Hinweise zur Konfiguration und zum Betrieb
The furnace includes four digital temperature controllers integrated in a separate console unit. The heating module can be mounted horizontally or vertically; vertical installation requires a user-supplied support frame. The furnace is designed for use with quartz or mullite tubes under vacuum or low pressure (below 0.2 bar). For safe operation, a two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI. Vacuum operation is recommended up to 1000°C maximum. Optional accessories include vacuum flanges, thermal blocks, digital vacuum gauges, rotary pumps with cold traps, and turbo pumps for high vacuum applications, which are sold separately.
