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MSK-AFA-MR200 Roll-to-Roll and Sheet Substrate Slot Die Coater for Ultrathin Films up to 10 µm Thickness

Designed for precise thin film coating on roll or sheet substrates in photovoltaic, OLED, fuel cell, and battery electrode research.
Supports continuous or multiple strips coating with adjustable slot die head orientation.
Operates with low-viscosity solutions (below 1000 cP) and features a compact convection oven for drying up to 120°C.
Equipped with syringe pump feeding and touch screen PLC control for coating speed and temperature.

규정 준수: CE 인증 획득
맞춤형: OEM/ODM
포장: 합판 케이스 포장

제품

MSK-AFA-MR200 Roll-to-Roll and Sheet Substrate Slot Die Coater for Ultrathin Films up to 10 µm Thickness

The MSK-AFA-MR200 is engineered to deliver precise ultrathin film coatings on both roll and sheet substrates, addressing the needs of advanced material research such as perovskite photovoltaic films, OLEDs, fuel cells, and battery electrodes. It excels in producing films thinner than 10 micrometers using low-viscosity solutions (under 1000 cP), making it suitable for delicate and uniform coatings required in high-performance thin film applications.

This system integrates a low-pressure stainless steel slot die coating head with adjustable orientation (vertical, 45 degrees, horizontal) to optimize coating uniformity and adaptability to various substrate geometries. The coating process can be continuous or configured for multiple strips, controlled via a user-friendly touch screen PLC interface. The compact convection oven provides forced hot air drying up to 120°C with ±1°C accuracy, ensuring consistent film curing. The coating unit can be separated from the control unit, allowing placement inside inert atmosphere glove boxes for sensitive materials.

주요 기능

  • High precision slot die coating with film thickness control down to ≤10 µm
  • Compatible with dilute solutions below 1000 cP viscosity for ultrathin films
  • Adjustable slot die head orientation: vertical, 45°, and horizontal positions
  • Supports both roll-to-roll and sheet substrate coating with max width 180 mm
  • Automatic syringe pump feeding with selectable volumes (10, 20, 30 mL) and adjustable feed rates
  • Compact forced convection oven for drying up to 120°C with uniform temperature control
  • Touch screen PLC control panel for coating speed (0–0.5 m/min), feeding rate, and temperature
  • Optional atmosphere plasma treatment for substrate surface activation
  • Coating unit separable from control unit for glove box integration

기술 사양

매개변수 사양
Power Supply 208–240 VAC, 50/60 Hz, Single Phase (4 kW power); 110 VAC option via transformer
Slot Die Head Material Stainless Steel (SUS630)
Maximum Coating Width 180 mm
Coating Thickness Range 5–300 µm (single layer), dependent on slurry viscosity, feed rate, and shim thickness
Shim Thicknesses Included 0.1, 0.2, 0.3, 0.4, 0.5 mm
Coating Speed 0–0.5 m/min, adjustable via touch screen
Syringe Pump Feeding Automatic, volumes 10/20/30 mL; feeding speed 0.01–10 mm/s; larger pumps optional
Heating Method Forced convection hot air oven (IR and UV optional)
Max Drying Temperature 120°C with ±1°C accuracy and ±5°C uniformity
Substrate Dimensions Width ≤ 200 mm; thickness 6–30 µm; roll inner diameter 75 mm; max outer diameter 150 mm
Reeling/Unreeling Mechanical expanding shaft (75 mm ID), tension controlled up to 20 N
Control Interface Touch screen PLC; coating speed, feed rate, and temperature control; remote control unit option

대표적인 적용 분야

Ideal for coating ultrathin films in research and development of perovskite solar cells, OLED displays, polymer ion conductive membranes, fuel cells, and battery electrode materials. Its precision and flexibility support experimental workflows requiring uniform thin films on flexible or rigid substrates.

구성 및 작동 안내

The system includes multiple shim thicknesses to tailor film thickness and a syringe pump for automated slurry feeding. Optional accessories include atmosphere plasma treatment for substrate surface activation and glove box integration for air-sensitive materials. The coating unit can be physically separated from the control unit to facilitate placement in controlled environments. Users should optimize slurry parameters and coating settings to achieve desired film uniformity and thickness.

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