RTP-II-5-R Rapid Thermal Processing Furnace with Rotating Holder for 5×5″ Wafer
The RTP-II-5-R furnace is engineered to facilitate rapid thermal processing tasks such as Close Spaced Sublimation (CSS) film coating on circular or square wafers up to 5 inches in size. It is particularly suited for research and development of advanced thin films used in solar cell technologies, including CdTe, sulfide, and perovskite materials. This system enables precise temperature control and uniform coating essential for high-quality thin film fabrication.
The furnace employs two independently controlled halogen heater groups positioned at the top and bottom, capable of reaching a maximum temperature of 800°C. The top sample holder is rotatable with adjustable speeds from 0 to 7 RPM, ensuring uniform thermal exposure and film deposition. The heating elements are stainless steel halogen lamps with a water-cooled jacket to minimize heat loss and enable rapid cooling. The quartz tube chamber provides a clean environment with vacuum capability down to 10-5 Torr when paired with an appropriate vacuum pump (sold separately).
주요 기능
- Dual halogen heating elements with independent PID-controlled temperature regulation.
- Rotatable top wafer holder adjustable from 0 to 7 RPM for uniform coating.
- Adjustable spacing between two 5″x5″ IR heating plates from 2 to 30 mm.
- High purity fused quartz tube chamber with stainless steel vacuum flanges.
- Vacuum capability down to 10-5 Torr with external molecular pump (not included).
- Integrated digital vacuum gauge and two K-type thermocouples for precise monitoring.
- Water-cooled heater jackets and included 58 L/min circulating water chiller for efficient thermal management.
기술 사양
| 매개변수 | 사양 |
|---|---|
| 최고 기온 | 800°C (each heater) |
| Heating Rate | Up to 10°C/s (max 10°C/s specified for heating rate) |
| Cooling Rate | Up to 10°C/s (600 to 100°C) |
| Heaters | 20 halogen lamps, stainless steel with water cooling |
| Sample Holder | 5″ diameter rotatable holder, speed adjustable 0-7 RPM |
| Chamber | High purity fused quartz tube, 11″ OD x 10.8″ ID x 9″ H |
| Vacuum Flanges | Stainless Steel 316 with double silicone O-rings |
| Vacuum Level | Down to 10-2 Torr with mechanical pump, 10-5 Torr with molecular pump (not included) |
| Temperature Controllers | Two digital PID controllers with 30-segment programming and PC interface |
| Thermocouples | Two K-type thermocouples (top and bottom) |
| Power Supply | 208-240 VAC, single phase, 50A breaker |
| Power Consumption | 10 kW total |
대표적인 적용 분야
The RTP-II-5-R furnace is ideal for research on thin film photovoltaic materials such as CdTe, sulfide, and perovskite solar cells. It supports rapid thermal evaporation and Close Spaced Sublimation processes requiring precise temperature control and uniform coating on wafers up to 5 inches square or circular. The rotating holder enhances film uniformity, critical for device performance studies.
구성 및 작동 안내
The system includes the furnace, dual temperature controllers, two-channel gas flowmeters, and a circulating water chiller. Vacuum pumps are not included and must be ordered separately to achieve the desired vacuum levels. For corrosive gases, additional cold traps or anti-corrosive dry pumps are recommended. Gas flow rates should be limited to below 200 SCCM to prevent thermal shock to the quartz tube. A two-stage pressure regulator is required on gas cylinders to maintain safe operating pressures below 3 PSI. The furnace frame is mobile but designed for smooth, even surfaces only.
