OTF-1200X-4-III-9HV Three-Zone 4-Inch Tube Furnace with Integrated High Vacuum Pump and 9-Channel Digital Gas Flow Control for CVD Applications
The OTF-1200X-4-III-9HV is engineered to support advanced chemical vapor deposition (CVD) and diffusion processes that demand precise temperature uniformity and controlled gas environments under vacuum conditions. This system integrates a 4-inch diameter fused quartz tube furnace with a high-performance vacuum pump and a sophisticated multi-gas flow control system, enabling complex process control for research and development or production settings.
This tube furnace incorporates three independently controlled heating zones spanning a total length of 880 mm, allowing a stable constant temperature zone of 500 mm with a tight tolerance of ±1°C. The heating elements are made from Fe-Cr-Al alloy doped with molybdenum, capable of reaching a maximum temperature of 1200°C with a controlled heating rate up to 20°C per minute. The furnace’s interior is lined with high purity alumina fiberboard to enhance thermal insulation and energy efficiency, while the exterior features a double-layer steel casing with air cooling.
주요 기능
- Four-inch fused quartz tube (100 mm O.D. x 92 mm I.D. x 1400 mm length) suitable for vacuum and low-pressure operations below 0.12 MPa absolute pressure.
- Three programmable digital temperature controllers with PID auto-tuning and 30-segment programming for precise zone temperature management.
- Integrated high vacuum station with a Pfeiffer turbomolecular pump capable of achieving ultimate pressures down to 10^-5 torr when coupled with the furnace.
- Vacuum accessories including stainless steel flanges, KF-25 and KF-40 connectors, needle valves, high-temperature silicone O-rings, and alumina thermo-blocks for flange protection.
- 9-channel digital mass flow controller system with PLC touch panel interface, allowing control of up to nine different gases with customizable flow ranges and ±1.5% full scale accuracy.
- Mobile cart design with wheels for ease of positioning and integrated gas mixing and vacuum systems.
- Safety features including over-temperature protection, broken thermocouple detection, and vacuum pump self-protection against overheating and overcurrent.
기술 사양
| 매개변수 | 사양 |
|---|---|
| Maximum Heating Temperature | 1200°C |
| Continuous Operating Temperature | 1100°C |
| Heating Rate | ≤ 20°C/min |
| Heating Zones | 3 zones (220 mm + 440 mm + 220 mm) |
| Constant Temperature Zone Length | 500 mm ±1°C |
| Tube Material and Size | Fused Quartz, 100 mm O.D. x 92 mm I.D. x 1400 mm length |
| Temperature Controllers | 3 digital PID controllers with 30-segment programming and auto-tune |
| Thermocouples | 3 K-type thermocouples |
| Power Supply | AC 208-240 V, Single Phase, 50/60 Hz, Max 7 kW |
| 진공 펌프 | Pfeiffer turbomolecular pump with LCD control panel, ultimate pressure 10^-5 torr (with furnace) |
| Vacuum Sensor Range | 10^-8 mbar to 10^3 mbar |
| Mass Flow Controllers | 9 channels, ranges from 0-100 SCCM up to customizable ranges, ±1.5% full scale accuracy |
| Vacuum Accessories | Stainless steel flanges, KF-25 and KF-40 connectors, needle valves, silicone O-rings, alumina thermo-blocks |
대표적인 적용 분야
This tube furnace system is ideal for chemical vapor deposition, thin film growth, diffusion studies, and other processes requiring precise temperature gradients and controlled multi-gas atmospheres under vacuum or low pressure. It suits research laboratories and industrial R&D environments focused on semiconductor, materials science, and nanotechnology applications.
구성 및 작동 안내
The system includes a mobile cart housing the vacuum pump and mass flow controllers, facilitating easy relocation and integration into existing lab setups. Optional accessories such as bubblers or evaporators for CVD can be ordered separately. Users must install a two-stage pressure regulator on gas cylinders to limit pressure below 3 PSI for safe operation. Gas flow rates should be limited to under 200 SCCM to minimize thermal shock to the quartz tube. The vacuum system features self-protection mechanisms to prevent pump damage from excessive leakage or overheating. The furnace and vacuum components are designed for use up to 1000°C under vacuum conditions.
