OTF1200XII Dual Zone Split Tube Furnace with Quartz Tube and Vacuum Flanges
The OTF1200XII is engineered for laboratory processes that demand precise temperature control across two separate heating zones within a quartz tube environment. This split tube furnace enables users to establish distinct temperature settings in each zone, facilitating the creation of thermal gradients essential for chemical vapor deposition (CVD) and nanomaterial fabrication.
Equipped with a 1000 mm long fused quartz tube and stainless steel vacuum flanges, the furnace supports vacuum and low-pressure operations up to 10^-2 torr with mechanical pumps and down to 10^-5 torr with molecular pumps. The system includes two microprocessor-based PID controllers, each capable of programming 30 temperature segments, ensuring accurate heating profiles and minimizing overshoot.
주요 기능
- Dual independent heating zones, each 196 mm long, total heating zone length 432 mm
- Continuous temperature range from 100°C to 1100°C; short-term operation up to 1200°C
- High-purity fibrous alumina insulation with Al2O3 coating for durability and energy efficiency
- Includes 1000 mm fused quartz tube with vacuum flanges, valves, and integrated vacuum pressure gauge
- Two K-type thermocouples and PID auto-tuning controllers with 30 programmable segments each
- Over-temperature protection, alarm system, and RS485 communication port for optional PC control
- Optional accessories include quartz thermal blocks, hinged vacuum flange assemblies, pressure and gas flow control modules
기술 사양
| 매개변수 | 사양 |
|---|---|
| 모델 | OTF1200XII |
| Heating Zones | 2 zones, each 196 mm (7.7″) length |
| Total Heating Zone Length | 432 mm (17″) |
| 온도 범위 | 100°C to 1100°C continuous; up to 1200°C for less than 1 hour |
| Max Heating Rate | ≤ 20°C/min |
| Temperature Controllers | 2 digital PID controllers with 30 programmable segments each, auto-tuning, ±1°C accuracy |
| Thermocouples | Two K-type (TCK8S3B) |
| Heating Element | Fe-Cr-Al alloy doped with Mo |
| Tube Included | Fused quartz tube, 1000 mm length, diameter selectable (60, 80, 100 mm) |
| Vacuum Flanges | SS 304 with double high-temp silicone O-rings, includes valves, fittings, and KF25 ports |
| Vacuum Capability | Down to 10^-2 torr with mechanical pump; 10^-5 torr with molecular pump (optional) |
| 전력 | 3 kW, 20A breaker |
| 전압 | AC 208-240V, single phase, 50/60 Hz |
대표적인 적용 분야
This furnace is well-suited for chemical vapor deposition (CVD) processes, nanomaterial synthesis, thin film preparation, and other research requiring controlled thermal gradients and vacuum or low-pressure environments.
구성 및 작동 안내
The standard package includes one fused quartz tube, vacuum flange set, and ceramic thermal blocks to reduce heat radiation. Optional accessories include quartz thermal blocks for enhanced vacuum performance, hinged vacuum flange assemblies for easier sample handling, pressure control modules, and gas flow control systems.
Vacuum operation is recommended only up to 1000°C for safety. Gas flow rates should be limited to under 200 SCCM to prevent thermal shock to the quartz tube. A two-stage pressure regulator must be installed on gas cylinders to maintain pressure below 3 PSI.
PC control is available via an optional MTS-02 control module and compatible software, enabling remote operation and detailed temperature profile management.
