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DZF6090HT Large 91L Vacuum Oven with Dual Heating Plates, Integrated Vacuum Pump & Water Chiller, 500°C Max Temperature

Capacity: 91 Liters (18x18x18 inches)
Max Temperature: 500°C with ±1°C programmable control
Includes dual-stage vacuum pump & recirculating water chiller
Weight: 400.2 lb (181.5 kg)

규정 준수: CE 인증 획득
맞춤형: OEM/ODM
포장: 합판 케이스 포장

제품

DZF6090HT Large 91L Vacuum Oven with Dual Heating Plates, Integrated Vacuum Pump & Water Chiller, 500°C Max Temperature

DZF6090HT is designed for laboratory processes requiring controlled vacuum drying and annealing of materials up to 500°C within a spacious 91-liter chamber. This oven is particularly suited for applications such as nanomaterial preparation and thermal treatment where precise temperature control and vacuum conditions are critical. The chamber dimensions are 18x18x18 inches (460x460x460 mm), providing ample space for larger samples or multiple items simultaneously.

The oven operates with two independently controlled stainless steel heating plates inside the vacuum chamber, each managed by a separate programmable temperature controller allowing up to 30 segments with ±1°C accuracy. This dual-zone heating enables maintaining a maximum temperature difference of 100°C between zones, optimizing uniform heating and process flexibility. The vacuum system includes a built-in dual-stage rotary vane vacuum pump with an exhaust filter, achieving a maximum vacuum better than 133 Pa (2 Torr). A mechanical vacuum gauge and a 1000 mL/min gas flowmeter are integrated for real-time monitoring of vacuum and gas flow parameters. Cooling is managed by an included digital-controlled recirculating water chiller with a 6-liter coolant tank, capable of maintaining temperatures between 5 and 35°C at a flow rate of 16 L/min.

주요 기능

  • Large 91-liter stainless steel chamber (1Cr18Ni9Ti) with dimensions 18x18x18 inches
  • Two SS304 heating plates inside chamber for direct heating, each with discrete programmable temperature control
  • Maximum operating temperature of 500°C with ±5°C uniformity in central chamber zone
  • Integrated dual-stage rotary vane vacuum pump with exhaust filter and mechanical vacuum gauge
  • 1000 mL/min gas flowmeter included for gas monitoring and control
  • Digital-controlled recirculating water chiller (EQ-KJ5000) included for stable cooling
  • Safety note: samples must not be placed directly on heating plates; use ceramic sheets or stainless trays

기술 사양

매개변수 사양
Chamber Material 1Cr18Ni9Ti Stainless Steel
Chamber Size 18x18x18 inches (460x460x460 mm), 91 Liters (3.4 cubic feet)
Heating Plates Two racks of SS304 plates, upper and lower zones (~170 mm height each)
온도 제어 Two programmable controllers, 30 segments, ±1°C accuracy
Operating Temperature Range 50°C to 500°C continuous
Max Temperature Difference Between Zones 100°C
온도 균일도 ±5°C in 12x12x12 inch chamber center
진공 펌프 Dual-stage rotary vane pump with exhaust filter, max vacuum <133 Pa (2 Torr)
Vacuum Gauge Built-in mechanical vacuum gauge; digital vacuum meter optional
Gas Flowmeter 1000 mL/min capacity for gas monitoring
Water Chiller Digital-controlled recirculating water chiller EQ-KJ5000, 5–35°C range, 16 L/min flow, 6 L tank
Power Supply Single Phase 208–240 VAC, 50/60 Hz, 2600 W, 20 A breaker required
무게 400.2 lb (181.5 kg)

대표적인 적용 분야

  • Drying and annealing of materials under vacuum or controlled atmosphere
  • Preparation and thermal treatment of nanomaterials
  • Vacuum drying of heat-sensitive samples
  • Material research requiring precise temperature and vacuum control

구성 및 작동 안내

  • The oven includes a rotary vane vacuum pump with exhaust filter and a recirculating water chiller as standard components for immediate operation.
  • Samples must never be placed directly on the heating plates; use ceramic sheets or stainless steel trays to avoid damage and ensure safety.
  • Optional digital vacuum meter and PC interface software modules are available for enhanced monitoring and control.
  • After extended high-temperature use, chamber discoloration and dulling may occur; this is normal and does not affect performance.

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