TM106-LD In-Situ Quartz Crystal Microbalance for Thin Film Thickness and Deposition Rate Monitoring
The TM106-LD is engineered to provide accurate, real-time monitoring of thin film deposition processes by measuring changes in mass on a quartz crystal sensor. This device is essential for applications requiring precise control over film thickness and deposition rates, such as semiconductor fabrication, optical coatings, and material research. It achieves sub-Angstrom resolution, enabling detection of extremely thin layers with high sensitivity.
The instrument operates on the quartz crystal microbalance principle, where the oscillation frequency of a quartz crystal changes proportionally to the mass of the deposited film. By knowing the density of the deposited material, the TM106-LD calculates film thickness with a resolution of ±0.037 Å. The system includes a sensor with quartz holder, a 6-inch BNC cable, and an SMA bulkhead adapter for integration with deposition chambers. It supports a stable frequency range from 6.0 to 5.0 MHz and can perform up to 10 measurements per second.
Wichtigste Merkmale
- High-resolution thickness measurement with ±0.037 Å sensitivity at 6 MHz frequency.
- Frequency stability within ±2 ppm ensures reliable and consistent readings.
- Includes STM-2 software compatible with Windows XP through Windows 8 for data acquisition and analysis.
- Standard package contains sensor with quartz holder, 6″ BNC cable, SMA bulkhead adapter, and a set of 10 gold quartz crystals.
- Operating temperature range from 0 to 50°C with water cooling feedthrough requiring minimum 150-200 cc/min flow.
- Optional quartz crystals available with gold, silver, or alloy electrodes tailored for specific deposition environments.
- Compact monitor size (114 mm x 76 mm x 25 mm) facilitates easy integration into existing setups.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 5 VDC, 400 mA |
| Frequency Range | 6.0 to 5.0 MHz (fixed) |
| Frequency Resolution | ±0.03 Hz @ 6 MHz |
| Measurement Speed | Up to 10 measurements per second |
| Reference Frequency Stability | ±2 ppm |
| Display Resolution | 0.1 Å |
| Operating Temperature | 0 to 50°C |
| Water Flow Requirement | Minimum 150-200 cc/min at max 30°C |
| Water Feedthrough Tubing | 1/8 in. (3.0 mm) O.D. |
| Operating System Compatibility | Windows 2000, XP, Vista, 7, 8 |
Typische Anwendungsbereiche
Ideal for monitoring thin film deposition in vacuum coating systems such as sputtering, thermal evaporation, and other physical vapor deposition (PVD) processes. It supports precise thickness control in semiconductor manufacturing, optical coatings, and research laboratories requiring high-resolution film characterization.
Configuration and Operating Notes
The standard package includes the sensor with quartz holder, a 6-inch BNC cable, SMA female-to-female bulkhead connector adapter for chamber feedthrough, and a set of 10 gold electrode quartz crystals. Optional quartz crystals with silver or alloy electrodes are available to accommodate different deposition stresses and heat loads. The STM-2 software facilitates real-time data acquisition and analysis on compatible Windows systems. Proper water cooling with specified flow rate is required to maintain sensor stability during operation. Additional accessories such as feedthroughs and flexibility testers can be purchased separately to enhance system integration and testing capabilities.
