HVHP-100 4-Inch Diameter High Vacuum Heating Plate for Sputtering Coaters, Up to 800°C
The HVHP-100 heating plate is engineered to provide precise and reliable heating for samples within high vacuum environments and glove boxes. It is particularly suited for researchers and technicians performing sputtering or evaporation coating processes, where controlled heating up to 800°C is essential for sample preparation and thin film deposition.
This unit features a 4-inch (130 mm) diameter heating plate with a 100 mm effective heating area, delivering uniform temperature distribution within ±5°C. The heating element is constructed from FeCrAl resistance wire, capable of sustaining temperatures up to 800°C for durations under 8 hours in air, vacuum, or inert gas atmospheres. Temperature monitoring is facilitated by an integrated K type thermocouple, ensuring accurate feedback for temperature control.
Wichtigste Merkmale
- Heating element: durable FeCrAl resistance wire designed for high temperature operation.
- Maximum working temperature of 800°C for up to 8 hours under air, vacuum, or inert gas conditions.
- Heating plate diameter: 130 mm outer dimension with a 100 mm active heating area.
- Temperature controlled by a SCR controller with 30 programmable segments and PID autotune for ±1°C accuracy.
- Includes K type thermocouple for precise temperature measurement.
- Input power: 110-120 VAC, 50/60 Hz single phase, with 850 W power consumption.
- Optional KF25/40 feedthrough available for integration into glove boxes or vacuum chambers.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Modell | HVHP-100 |
| Heating Element | FeCrAl resistance wire |
| Höchsttemperatur | 800°C (up to 8 hours) |
| Heating Plate Diameter | 130 mm OD, 100 mm heating area ±5°C |
| Erwärmungsgeschwindigkeit | 5°C per minute (recommended) |
| Thermoelement | K type (included) |
| Temperaturregler | SCR controller with 30 programmable segments, PID autotune, ±1°C accuracy |
| Eingangsspannung | 110-120 VAC, 50/60 Hz, single phase |
| Stromverbrauch | 850 W |
| Optional Accessories | KF25/40 feedthrough for glove box or vacuum chamber integration |
Typische Anwendungsbereiche
The HVHP-100 is commonly used as a heatable sample holder in sputtering and evaporation coating systems, particularly in DIY or custom-built setups. It supports thin film deposition processes such as sputtering, chemical vapor deposition (CVD), and physical vapor deposition (PVD) by providing stable and uniform heating under vacuum or inert atmospheres.
Hinweise zur Konfiguration und zum Betrieb
The heating plate includes a K type thermocouple and an SCR temperature controller with programmable segments and PID autotuning for precise temperature management. For integration into glove boxes or vacuum chambers, an optional KF25/40 feedthrough is available to safely route power and sensor connections. Users should adhere to the recommended heating rate of 5°C per minute to ensure uniform temperature increase and avoid thermal stress. The maximum operating temperature of 800°C is rated for durations less than 8 hours; extended use at this temperature should be verified with the manufacturer.
Maße & Versand
| Product dimensions | Φ130 mm OD x 50 mm H; Heating area:100 mm diameter with +/- 5ºC |
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