DC-500-LD 500W DC Plasma Sputtering Power Supply with Arc Suppression and Adjustable Regulation Modes
The DC-500-LD power supply is engineered to meet the demands of DC magnetron sputtering processes commonly used in thin film deposition and surface coating laboratories. It provides stable and efficient DC power output tailored for plasma generation, enabling precise control over sputtering conditions essential for uniform film growth and reproducible results.
This compact unit incorporates specialized circuitry to minimize stored energy at the output, significantly reducing the risk of damaging arcs. It supports both arc suppression for sensitive applications and arc control for processes requiring sustained arcs. Users can select regulation modes—constant power, current, or voltage—via front panel controls, with the ability to ramp power smoothly to the desired set point, enhancing process stability and control.
Wichtigste Merkmale
- Maximum output power of 500W suitable for small to medium scale sputtering applications.
- Output voltage up to 600V DC and current up to 0.8A with fine resolution (1V voltage, 1mA current).
- Integrated arc suppression and arc control circuitry for enhanced plasma stability and equipment protection.
- Selectable regulation modes: constant power, constant current, or constant voltage with ramping capability.
- Output connector type SL16 (UHF female) compatible with standard sputtering sources.
- Compact design with efficient operation exceeding 90% efficiency.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Eingangsspannung | AC 220V ±10% |
| Maximum Output Power | 500W |
| Maximum Output Voltage | 600V DC |
| Voltage Resolution | 1.0V |
| Maximum Output Current | 0.8A DC |
| Current Resolution | 1mA |
| Control Accuracy | ±1% |
| Output Connector | SL16 (UHF female) |
Typische Anwendungsbereiche
The DC-500-LD is ideal for powering DC magnetron sputtering sources used in thin film deposition for research and development, coating of optical, electronic, and decorative surfaces, and materials science laboratories requiring controlled plasma environments.
Hinweise zur Konfiguration und zum Betrieb
Optional accessories include a 2″ high vacuum magnetron sputtering source compatible with this power supply for immediate integration. A high vacuum quick disconnect fitting is available to facilitate installation onto vacuum chamber baseplates with 1″ diameter through-holes. Users should ensure proper grounding and follow safety protocols for high-voltage plasma equipment operation.
Maße & Versand
| Product dimensions | Case: W440mm X H85mm X D403mm; Front Face: W440mm X H85mm |
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