MSK-SP-04-HT High-Throughput Ultrasonic Spray Pyrolysis System with 3-Element Mixing and 36-Position Coating in Controlled Atmosphere
The MSK-SP-04-HT system addresses the need for efficient and versatile thin film deposition, particularly for advanced materials such as battery electrodes and perovskite solar cells. It enables simultaneous processing of multiple solution compositions by mixing three distinct solutions and applying them onto substrates with high precision. This system is designed to coat up to 36 discrete positions on 18 mm diameter substrates, facilitating high-throughput experimentation and material development.
Operating within a vacuum chamber capable of reaching 20 torr, the system allows spray pyrolysis under controlled atmospheres to optimize film quality and chemical reactions. The heated substrate platform can reach temperatures up to 500ºC for pyrolysis treatment, with temperature uniformity maintained within ±5ºC. The integrated X-Y-Z precision travel mechanism positions the spray nozzle accurately over the substrate array, supporting localized coating with programmable parameters.
Wichtigste Merkmale
- Three-solution mixing and dispersion in a 50 ml container with blade stirring at 120 RPM for uniform composition.
- Two optional spray nozzles: a compressive air nozzle for high-viscosity slurries (300–500 CPS) and a high-power ultrasonic nozzle with 3000W 20 kHz generator for lower viscosity films.
- Four syringe pumps included: three for solution delivery and one for DI water cleaning; adjustable line speed from 1 µm/min to 120 mm/min with ±0.5% accuracy above 30% full scale.
- Vacuum chamber constructed from stainless steel with dimensions 650 x 600 x 500 mm and equipped with a dual-stage mechanical pump for vacuum down to 20 torr.
- Precision X-Y-Z travel system inside the vacuum chamber with travel ranges of 200 mm (X-Y) and 60 mm (Z), speeds from 1 mm/s to 12 mm/s.
- Substrate plate with 36-position cylinder mask (18 mm diameter standard) and integrated heating plate for pyrolysis treatment up to 500ºC.
- 7″ touchscreen control panel enabling programming of vacuum, inert gas purging, flow rates, spraying time, and recipe storage for automated operation.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Leistungsaufnahme | 208 – 240 VAC, 50/60 Hz, single phase, 4000 W total |
| Spray Nozzles | Two optional nozzles: compressive air nozzle for 300–500 CPS slurry; ultrasonic nozzle with 3000W 20 kHz generator |
| Syringe Pumps | Four included; 60 ml standard capacity; line speed 1 µm/min to 120 mm/min; accuracy ±0.5% (>30% FS) |
| Solution Mixing Container | Φ25 x 100 mm, ~50 ml volume; blade stirring at 120 RPM |
| Vacuum Chamber | Stainless steel; 650 x 600 x 500 mm; max vacuum 20 torr; dual-stage mechanical pump included |
| Travel Mechanism | X-Y: 200 mm max; Z: 60 mm max; speed 1–12 mm/s |
| Substrate Mask | 36 cylinders; 18 mm diameter standard; other sizes available |
| Heating Plate | RT to 500ºC max (<30 min); temperature uniformity ≤±5ºC; optional vacuum chuck plate available |
| Steuereinheit | 7″ touchscreen; programmable vacuum, inert gas purging, flow rates, spraying time; 128 recipe storage; manual and automatic modes |
Typische Anwendungsbereiche
This system is ideal for research and development of thin films in battery electrode fabrication, perovskite solar cell production, and oxide transparent conductive coatings. Its controlled atmosphere capability supports sensitive material processing requiring inert or reduced pressure environments.
Hinweise zur Konfiguration und zum Betrieb
Optional accessories include alternative syringe capacities, additional spray nozzles, and a PC operation software package for enhanced control. The chamber includes a pressure release valve limiting maximum pressure to 0.02 MPa for safety. Users should ensure proper handling of compressed gases and maintain vacuum pump operation according to manufacturer guidelines.
