OTF-1200X-100-EDSL 1200°C Sliding Tube Furnace with 100mm OD Quartz Tube for Rapid Thermal Processing and CVD Applications
The OTF-1200X-100-EDSL is engineered for laboratory processes that demand rapid and precise thermal cycling, such as chemical vapor deposition (CVD) of graphene and carbon nanotubes. Its sliding tube design allows the heating zone to move along the quartz tube, enabling swift heating and cooling of samples without manual repositioning.
This furnace features a maximum operating temperature of 1200°C with continuous operation recommended up to 1100°C. The heating zone spans 400mm, and the sliding mechanism moves the tube up to 400mm at adjustable speeds between 10 and 100 mm/s. The system is controlled via a touchscreen PLC interface with two PID controllers, allowing programmable temperature profiles with up to 50 segments for heating, cooling, and dwell times.
Wichtigste Merkmale
- Sliding rail mechanism enables rapid thermal cycling by moving the heating zone along the tube.
- Maximum temperature of 1200°C with ±1°C accuracy using dual PID controllers.
- Adjustable sliding speed from 10 to 100 mm/s, programmable to move back and forth automatically.
- Supports vacuum processing with stainless steel sealed flanges and KF25 vacuum interface.
- Quartz tube options up to 100 mm outer diameter and 1400 mm length for versatile sample accommodation.
- Overheating and thermocouple break protection integrated for safe operation.
- PC communication port and included MTS-02 module for external control and monitoring.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | AC 208-240V, Single Phase, 50/60 Hz, 3 kW |
| Höchsttemperatur | 1200°C (up to 0.5 hrs), Continuous ≤1100°C |
| Heating Zone Length | 400 mm |
| Erwärmungsgeschwindigkeit | Recommended ≤10°C/min; max heating rate on left sample area: 3°C/s |
| Sliding Distance | 400 mm (customizable) |
| Sliding Speed Range | 10–100 mm/s (customizable), programmable back and forth movement |
| Temperaturregelung | Two PID controllers, 50 programmable segments, ±1°C accuracy |
| Thermoelementtyp | Typ K |
| Vacuum Flanges | Stainless steel sealed flanges with O-rings; left flange with KF25 vacuum interface, needle valve, barb vent; right flange with needle valve, G1/4 air inlet, mechanical pressure gauge |
| Quartz Tube Dimensions | Available sizes up to 100 mm OD x 95 mm ID x 1400 mm length |
| Vakuumfähigkeit | Down to 10^-2 torr with mechanical pump; 10^-5 torr with molecular pump (pump not included) |
| Abkühlgeschwindigkeit | Rapid cooling up to 3°C/s (500–100°C), 0.7°C/s (500–200°C) |
| Einhaltung der Vorschriften | CE Certified; optional NRTL (UL61010) or CSA certification available |
Typische Anwendungsbereiche
Ideal for rapid thermal processing tasks including annealing, sintering, and material synthesis under controlled atmospheres. Commonly used in CVD growth of graphene and carbon nanotubes, as well as vacuum and low-pressure thermal treatments.
Hinweise zur Konfiguration und zum Betrieb
The furnace includes a sliding rail system and sealed vacuum flanges but requires separate vacuum pumps for achieving desired vacuum levels. A two-stage pressure regulator must be installed on gas cylinders to maintain safe operating pressures below 3 PSI. The system supports PC control via the included MTS-02 module; a laptop with pre-installed software is recommended and available as an optional purchase to ensure compatibility and ease of setup.
