OTF-1200X-II-PE-RR Roll to Roll PE-CVD System for Continuous Graphene and 2D Film Growth on Wire or Foil
The OTF-1200X-II-PE-RR is a laboratory-scale roll-to-roll plasma-enhanced chemical vapor deposition (PE-CVD) system tailored for continuous synthesis of graphene and other two-dimensional films on flexible substrates such as thin foil or wire. This system enables researchers and developers to explore scalable film growth processes by continuously feeding substrate material through a heated quartz tube furnace under plasma activation.
Central to the system is an 80 mm outer diameter quartz tube housed within a two-zone split tube furnace capable of reaching a maximum temperature of 1200°C for short durations and 1100°C for continuous operation. The furnace zones include a 440 mm programmable heating section and a 250 mm constant temperature zone, controlled with ±1°C precision. The integrated 300W radio frequency plasma source operates at 13.56 MHz with automatic impedance matching, providing stable plasma conditions essential for enhanced chemical vapor deposition.
Wichtigste Merkmale
- Dual-zone tube furnace with max 1200°C temperature and programmable 30-segment temperature profiles.
- 300W RF plasma source with automatic matching and stable output for plasma-enhanced deposition.
- Roll-to-roll vacuum chambers at both ends with substrate reeling speed adjustable from 1 to 400 mm/min.
- Three-channel mass flow controller gas delivery system calibrated for Ar, H2, and methane gases.
- Heavy-duty rotary vane vacuum pump achieving vacuum down to 10-2 Torr with digital pressure monitoring.
- 7-inch touchscreen control panel for integrated operation of temperature, gas flow, and plasma power.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Röhrenofen | Two heating zones: 440 mm programmable + 250 mm constant temperature |
| Höchsttemperatur | 1200°C (up to 60 min), 1100°C continuous |
| Temperaturregelung | 30 programmable segments, ±1°C accuracy (Eurotherm option ±0.1°C) |
| Quartz Tube Dimensions | 80 mm OD × 72 mm ID × 1400 mm length (optional 100 mm OD tube) |
| RF Plasma Source | 300 W adjustable power, 13.56 MHz frequency, automatic matching |
| Gas Delivery | Three MFC channels: 0–100 SCCM (Ar), 1–199 SCCM (H2), 1–499 SCCM (CH4) |
| Vakuumpumpe | Rotary vane pump, 7.8 CFM, two-stage exhaust, vacuum to 10-2 Torr |
| Control Interface | 7″ touchscreen panel; PC control software optional |
| Stromversorgung | 208–240 V AC, single phase, max 3 kW |
Typische Anwendungsbereiche
This system is ideal for research and development of continuous graphene film growth and other two-dimensional materials on flexible substrates such as copper foil or wire. It supports scalable process development for electronics, sensors, and advanced material coatings requiring uniform thin films over long substrate lengths.
Hinweise zur Konfiguration und zum Betrieb
The system includes one roll of copper foil (65 mm width, 0.025 mm thickness) for initial practice. Optional upgrades include larger diameter quartz tubes (up to 100 mm OD or 8″ OD) for wider substrates and three-zone furnaces for advanced temperature profiling. An oil-less vacuum pump and PID-controlled vacuum system are available as optional enhancements. Safety features include over-temperature protection and gas leak alarms for hydrogen and methane gases. Remote PC control software can be provided upon request.
