OTF-1200X-III-RR Roll-to-Roll CVD System for Continuous 2D Film Growth and Wire Annealing
The OTF-1200X-III-RR is engineered to facilitate continuous chemical vapor deposition (CVD) processes on flexible substrates such as copper foil, enabling scalable production of graphene and other two-dimensional films. This system supports research and development efforts aimed at advancing roll-to-roll manufacturing technologies by providing precise control over substrate transport and thermal processing.
Wichtigste Merkmale
- Three-zone split tube furnace with independent temperature control and PID auto-tuning for ±1°C accuracy.
- 100 mm diameter, 1400 mm length high-purity quartz processing tube connected to vacuum chambers.
- Dual vacuum chambers for substrate feeding and take-up, maintaining vacuum levels around 5 × 10⁻² Torr.
- Integrated 7-inch touchscreen control panel for temperature and process monitoring.
- Optional gas delivery system with three mass flow controllers for methane, hydrogen, and argon gases.
- Optional vacuum pump and valve system including two-stage rotary vane pump and digital vacuum gauge.
- Capability for hydrogen wire annealing and custom large-diameter tube configurations upon request.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Furnace Type | Three-zone split tube furnace |
| Höchsttemperatur | 1200°C (max 60 min), 1100°C continuous |
| Heating Zones Length | 600 mm total (150 mm + 300 mm + 150 mm) |
| Quartz Tube Dimensions | Ø100 mm × 1400 mm length |
| Substrate Transport Speed | 1–400 mm/min adjustable |
| Vakuumniveau | Approx. 5 × 10⁻² Torr in vacuum chambers |
| Stromversorgung | 220 V AC, single phase, 50/60 Hz |
| Maximale Leistungsaufnahme | 5 kW (furnace), optional 23 kW gas delivery system |
| Temperaturregelung | Three independent digital controllers with PID auto-tuning, ±1°C accuracy |
| Control Interface | 7-inch touchscreen panel |
Typische Anwendungsbereiche
The OTF-1200X-III-RR is primarily used for continuous graphene growth on copper foil substrates, enabling scalable production of two-dimensional materials. It also supports thin-film deposition research for flexible electronics, sensors, and advanced material coatings. Optional configurations allow hydrogen wire annealing and processing of larger substrate widths.
Hinweise zur Konfiguration und zum Betrieb
The system includes one roll of copper foil (80 mm width, 0.025 mm thickness) for practice substrate feeding and graphene growth. Optional accessories include a three-channel gas delivery station with mass flow controllers for methane, hydrogen, and argon gases, and a vacuum pump and valve system with a two-stage rotary vane pump. Safety precautions require installation of hydrogen and methane gas leak detection and alarm systems when these gases are used. The maximum furnace temperature should not exceed 1200°C for more than 60 minutes, with continuous operation recommended below 1100°C. The tension control mechanism enhances substrate handling consistency and was integrated into the design starting January 2023. Confirm optional equipment inclusion and plasma functionality availability when ordering, as some features depend on selected configurations.
Maße & Versand
| Product dimensions | Length: 2400 mm; Width: 600 mm; Height: 1400 mm | 2400 × 600 × 1400 mm (L × W × H) |
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