OTF1200XSF2 Mini CVD Tube Furnace with 2-Channel Gas Mixer, Vacuum Pump, and Digital Vacuum Gauge, Up to 1200°C
The OTF1200XSF2 is a compact chemical vapor deposition (CVD) tube furnace designed to facilitate precise thermal processing of samples under controlled gas and vacuum conditions. It is engineered to reach temperatures up to 1200°C for short durations and maintain continuous operation at 1100°C, making it suitable for advanced material synthesis and thin film deposition tasks requiring strict temperature and atmosphere control.
This system integrates a quartz processing tube with dimensions of 50 mm outer diameter, 43 mm inner diameter, and 450 mm length, housed within a heavily insulated steel casing to optimize energy efficiency. The heating zone spans 200 mm with a stable constant temperature region of 60 mm, ensuring uniform sample treatment. Temperature control is managed by a PID controller with auto-tuning and 30 programmable segments, delivering ±1°C accuracy and safety features including over-temperature alarms and thermocouple failure protection.
Wichtigste Merkmale
- Maximum temperature of 1200°C for up to 1 hour; continuous operation at 1100°C.
- Quartz tube processing chamber (50x43x450 mm) with two thermal blocks for sample placement.
- Integrated 2-channel gas mixing station with floating flow meters (16-100 mL/min) and stainless steel vacuum needle valves.
- Corrosion-resistant capacitance diaphragm vacuum gauge measuring 10-5 to 1000 torr for accurate pressure monitoring with mixed gases.
- Double-stage rotary vane vacuum pump included, capable of reaching vacuum pressures down to 1E-2 Torr (50 mTorr).
- PID temperature controller with 30 programmable segments, auto-tune, and multiple safety protections.
- Heavy-duty steel casing with energy-efficient Al2O3 fibrous insulation.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Höchsttemperatur | 1200°C (up to 1 hour), 1100°C continuous |
| Erwärmungsgeschwindigkeit | ≤ 10°C/min |
| Processing Tube | Quartz tube, 50 mm O.D. × 43 mm I.D. × 450 mm length |
| Heating Zone Length | 200 mm total; 60 mm constant temperature zone (±1°C at 900°C) |
| Temperaturregler | PID with auto-tune, 30 programmable segments, ±1°C accuracy, over-temperature and thermocouple failure protection |
| Gas Mixing Station | 2 channels, floating flow meters (16-100 mL/min), stainless steel vacuum needle valves, 1/4″ pipe fittings |
| Vakuummeter | Corrosion-proof capacitance diaphragm gauge, 10-5 to 1000 torr range |
| Vakuumpumpe | Double-stage rotary vane pump, 156 L/min, oil trap, exhaust filter, KF-D25 inlet |
| Stromverbrauch | 1.75 kW |
| Eingangsspannung | AC 110 V (contact support for AC 220 V use) |
| Isolierung | Al2O3 fibrous thermal insulation |
| Casing | Heavy-duty steel |
Typische Anwendungsbereiche
This mini CVD tube furnace is ideal for thin film deposition, material synthesis, semiconductor research, and vacuum annealing processes requiring precise temperature and atmosphere control. It supports experiments involving aggressive gases due to its corrosion-resistant vacuum gauge and allows for accurate gas mixing and pressure monitoring.
Hinweise zur Konfiguration und zum Betrieb
The system includes the quartz tube, two thermal blocks for sample placement, a 2-channel gas mixing station, a digital vacuum gauge, and a double-stage rotary vane vacuum pump with oil trap and exhaust filter. Vacuum fittings include KF-25 clamps, a 1/4″ Swagelok tube connector, and stainless steel vacuum bellows.
Users should limit gas flow rates to below 200 mL/min to avoid thermal shock to the quartz tube and maintain vacuum pressures below 0.2 bar (3 psi). A two-stage pressure regulator is recommended on gas cylinders to ensure safe operation under low pressure. The furnace is CE certified, with additional certifications available upon request.
