GSL-1100-Micro Micro-CVD/PVD Furnace with Dual Heating Zones and In-Situ Optical Observation up to 1100°C
The GSL-1100-Micro is a specialized micro-tube furnace designed for chemical vapor deposition (CVD), physical vapor deposition (PVD), and hybrid HPCVD processes. It facilitates detailed in-situ analysis of two-dimensional film growth by integrating a flat UV-grade quartz window within its processing tube, allowing direct observation under optical microscopes or Raman spectroscopy setups. This capability is essential for researchers studying thin film formation dynamics at elevated temperatures up to 1100°C.
The furnace incorporates two ceramic-coated heating plates positioned inside a 25 mm inner diameter quartz tube. These plates are independently controlled by a dual-zone temperature controller with 30 programmable segments, enabling precise thermal management. The left heating plate is adjustable to optimize sample positioning and temperature uniformity. The system supports rapid heating rates up to 5°C per second, facilitating efficient thermal cycling during experiments.
Wichtigste Merkmale
- Dual independently controlled ceramic-coated heating plates inside a quartz tube with 25 mm ID.
- Flat 12 mm diameter UV-grade quartz window welded on the tube for real-time optical observation.
- Maximum operating temperature of 1100°C with a heating rate up to 5°C/s (300°C/min).
- Dual temperature controller with 30 programmable segments and PID auto-tuning for precise thermal control.
- Vacuum-sealed flange assembly with KF 25 ports for electrodes, thermocouples, and gas inlet/outlet connections.
- Includes adjustable flange supports and two K-type thermocouples for accurate temperature monitoring.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Power Requirement | Single Phase 110 VAC, 50/60 Hz, 3000 W (15 A circuit breaker required); 220 VAC version available via transformer |
| Quartz Tube Dimensions | Outer Diameter 30 mm × Inner Diameter 24 mm × Length 370 mm |
| Sichtfenster | 12 mm diameter flat UV-grade quartz window welded on tube |
| Heizplatten | Two ceramic-coated plates, each 17 mm × 25 mm; left plate adjustable |
| Höchsttemperatur | 1100°C |
| Maximum Heating Rate | 5°C/s (300°C/min) |
| Temperaturregelung | Dual zone controller with 30 programmable segments, PID auto-tune, ±1°C accuracy |
| Thermocouples | Two K-type thermocouples, one per heating zone |
| Vakuumanschlüsse | KF 25 vacuum-sealed flange with feed-throughs for electrodes, thermocouples, gas inlet/outlet |
Typische Anwendungsbereiche
This furnace is ideal for research requiring controlled deposition of thin films via CVD, PVD, or combined hybrid processes. It supports in-situ optical and spectroscopic monitoring of film growth, making it suitable for materials science, semiconductor research, and nanotechnology development.
Hinweise zur Konfiguration und zum Betrieb
The system includes vacuum-sealed flanges with KF 25 ports for integration with vacuum pumps and gas delivery systems. Optional accessories include a corrosion-proof digital vacuum gauge, double-stage rotary vane vacuum pump, and precision mass flow controllers for gas flow regulation. A LabVIEW-based temperature control software package with laptop and WiFi control is available optionally for advanced temperature profiling and data logging. Proper electrical supply and circuit protection (15 Amp breaker) are required for safe operation.
