ALD-1200X-R-4 4-Inch Rotation Tube Furnace System for Powder Surface Coating via ALD and CVD up to 1200°C
The ALD-1200X-R-4 is engineered to address the challenge of achieving uniform and controlled surface coatings on powder materials through advanced Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) techniques. This system integrates a 4-inch quartz tube rotation furnace with precise temperature and gas flow control, enabling researchers to perform surface modifications with high reproducibility and efficiency.
The furnace supports continuous heating up to 1100°C, controlled by dual programmable digital temperature controllers capable of 30-segment temperature profiles. Rotation speeds from 0 to 10 RPM ensure homogeneous exposure of powders to reactive gases. The system’s design incorporates two ALD valves with pulse controllers and an automatic liquid-vapor generator, facilitating precise precursor delivery and reaction control.
Wichtigste Merkmale
- 4″ quartz tube rotation furnace with max continuous temperature of 1100°C and programmable temperature segments.
- Two-channel ALD valves with pulse control down to 10 ms duration and thermal actuators for heating.
- Integrated automatic liquid-vapor generator connected to ALD valves for precise precursor delivery.
- Four-channel gas delivery system with mass flow controllers for ALD and CVD processes.
- Rotation speed adjustable from 0 to 10 RPM for uniform coating on powders.
- Anti-corrosive pressure gauge with wide measurement range (3.8×10-5 to 1125 Torr) and fast atmospheric detection.
- PLC-based control panel with 6″ touchscreen interface consolidating vapor, ALD, and gas flow parameters.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Maximum Continuous Temperature | 1100°C |
| Temperature Controllers | Two programmable digital controllers, 30 segments |
| Tube Diameter | 4 inches (quartz) |
| Drehzahl | 0–10 RPM |
| ALD Valves | Two channels with pulse controller (min 10 ms), thermal actuators |
| Gas Delivery Channels | Four channels with mass flow controllers |
| Liquid-Vapor Generator | Automatic, integrated with ALD valves |
| Pressure Gauge | Anti-corrosive, 3.8×10-5 to 1125 Torr range |
| Stromversorgung | 208–240 V AC, single phase, max 4 kW |
Typische Anwendungsbereiche
This system is ideal for research groups focused on modifying powder surfaces with atomic-scale precision coatings. It is particularly suited for reducing interfacial impedance in solid-state battery materials, thin film deposition research, and catalyst preparation where uniform ALD or CVD coatings on particulate substrates are required.
Hinweise zur Konfiguration und zum Betrieb
The system includes the rotation tube furnace, integrated ALD valves, liquid-vapor generator, and control panel. A vacuum pump is optional and recommended for CVD processes to achieve pressures down to 10E-2 Torr. Additional accessories such as stainless steel bubblers, evaporators, constant pressure control modules, and quartz crystal monitors for film thickness can be added separately. Safe operation requires a two-stage pressure regulator on gas cylinders limiting pressure below 3 PSI and gas flow rates below 200 SCCM to prevent thermal shock to the quartz tube.
