GSL1100X8 1100°C Quartz Tube Furnace with 8.5″ Diameter and Water-Cooled Hermetic Flanges for Controlled Atmosphere CVD Processing
The GSL1100X8 tube furnace is engineered for high-temperature chemical vapor deposition (CVD) applications requiring precise thermal processing of large samples or wafers. Its 8.5-inch diameter quartz tube accommodates sizable substrates, while the 24-inch (600 mm) heating zone provides a uniform temperature environment essential for consistent material synthesis and treatment.
This furnace integrates a single heating zone controlled by a programmable PID temperature controller capable of up to 30 segments, ensuring accurate temperature profiles. The system includes water-cooled stainless steel hermetic flanges that maintain a controlled atmosphere within the quartz tube, supporting processes sensitive to environmental conditions.
Wichtigste Merkmale
- Maximum operating temperature of 1100°C with continuous operation between 400°C and 1050°C.
- Effective heating zone length of 600 mm with a ±5°C uniform temperature zone of 200 mm.
- Quartz processing tube with 216 mm outer diameter and 208 mm inner diameter, 1020 mm length.
- Water-cooled hinged stainless steel hermetic flanges with integrated pressure gauge and multiple feedthrough ports.
- Programmable PID temperature controller with dual K-type thermocouples for control and monitoring.
- Double-layer steel casing with cooling fans to maintain surface temperature below 70°C.
- Optional Eurotherm 3000 series temperature controller for enhanced accuracy and LabVIEW-based remote control software.
Technische Daten
| Parameter | Spezifikation |
|---|---|
| Stromversorgung | 208 – 240 VAC, 50 A, 50/60 Hz, 8 kVA |
| Höchsttemperatur | 1100°C |
| Continuous Operating Temperature Range | 400 – 1050°C |
| Maximum Heating Rate | 20°C/min (recommended <10°C/min) |
| Heating Zone Length | 600 mm (24″) |
| Uniform Temperature Zone | 200 mm ±5°C |
| Processing Tube Dimensions | Quartz tube, 216 mm OD × 208 mm ID × 1020 mm length |
| Heating Element | NiCrAl resistance wire |
| Isolierung | High purity alumina fibrous insulation and alumina-silicate fibrous thermal blocks |
| Temperaturregler | Programmable PID with 30 segments, dual K-type thermocouples, ±1°C accuracy |
| Hermetic Flanges | Hinged stainless steel with water cooling, pressure gauge (-0.1 to 0.15 MPa), gas inlet/outlet, thermocouple feedthrough, KF25 vacuum port |
| Betriebsdruck | Less than 3 psig |
Typische Anwendungsbereiche
Ideal for chemical vapor deposition (CVD) processes involving large wafers or substrates requiring precise temperature control and controlled atmosphere environments. Suitable for research and development in materials science, semiconductor fabrication, and thin film deposition.
Hinweise zur Konfiguration und zum Betrieb
The furnace requires a water chiller providing ≥10 L/min flow at 5-30°C and 10-60 PSI for flange cooling; a KJ5000 recirculating water chiller is recommended. Optional accessories include a Eurotherm 3000 series temperature controller for enhanced stability and LabVIEW-based remote control software for temperature profile management and data logging. Proper handling of quartz tubes and O-ring seals is necessary to maintain hermetic conditions. Safety precautions should be observed when operating at high temperatures and pressures.
