Kategorie

Kontaktieren Sie uns

OTF-1200X-II-ZL Dual Zone Split Tube Furnace with 4-Source Revolving Feeding System for HPCVD of Multilayer 2D TMDs up to 1200°C

Designed for high-precision deposition of multilayer 2D transition metal dichalcogenides (TMDs) using hybrid PVD and CVD.
Features a dual-zone split tube furnace with independent temperature control and a revolving system for sequential evaporation from four crucibles.
Operates continuously up to 1100°C and up to 1200°C for short durations with precise PID temperature control.
Includes integrated PLC touchscreen for feeding control and real-time temperature monitoring of samples.

Konformität: CE-zertifiziert
Maßgeschneidert: OEM/ODM
Verpackung: Sperrholzkiste

Produkte

OTF-1200X-II-ZL Dual Zone Split Tube Furnace with 4-Source Revolving Feeding System for HPCVD of Multilayer 2D TMDs up to 1200°C

The OTF-1200X-II-ZL is engineered to address the complex requirements of depositing multilayer two-dimensional transition metal dichalcogenides (TMDs) via hybrid physical and chemical vapor deposition (HPCVD). This system integrates a dual-zone split tube furnace with a unique revolving sample feeding mechanism, enabling precise sequential evaporation from up to four crucibles loaded with different source materials. This design facilitates controlled multilayer growth by allowing each material to be evaporated at optimal temperatures within a single processing run.

The furnace features two independently controlled heating zones, each 200 mm in length, providing a total heating zone of 400 mm. Each zone maintains a stable constant temperature region of approximately 150 mm with ±1°C accuracy, which can be extended to about 250 mm by setting both zones to the same temperature. The system supports continuous operation from 100°C to 1100°C and can reach up to 1200°C for short durations under one hour, with a maximum heating rate of 20°C per minute. The revolving feeding system, driven by a stepper motor, moves crucibles through the atmosphere-controlled quartz tube, allowing real-time temperature monitoring via a thermocouple connected to the crucible.

Wichtigste Merkmale

  • Dual independent PID temperature controllers with 30 programmable segments for precise heating and cooling profiles.
  • Revolving feeding system accommodates four quartz crucibles, enabling sequential evaporation under vacuum or inert gas.
  • Built-in PLC touchscreen interface for managing feeding sequences and monitoring sample temperatures in real time.
  • Double-layer steel casing with air cooling keeps external surface temperature below 60°C for safe operation.
  • High-purity fibrous alumina insulation and refractory coating on liner and heating elements enhance energy efficiency and furnace longevity.
  • Includes corrosion-resistant capacitance diaphragm vacuum gauge and double-stage rotary vane vacuum pump for controlled atmosphere processing.
  • Optional PC control software and Eurotherm 3000 controllers available for enhanced temperature accuracy and remote operation.

Technische Daten

Parameter Spezifikation
Modell OTF-1200X-II-ZL
Heizzonen 2 independent zones, each 200 mm length (total 400 mm)
Constant Temperature Zone Length Approx. 150 mm per zone (±1°C); up to 250 mm combined
Temperaturbereich 100–1100°C continuous; up to 1200°C for <1 hour
Max Heating Rate ≤ 20°C/min
Stromversorgung Single Phase 208–240 VAC, 3 kW (requires 20 Amp breaker)
Feeding System Stepper motor-driven revolving system for 4 crucibles; travel distance 1–200 mm
Temperaturregelung Two digital PID controllers with 30 programmable segments; ±1°C accuracy; K-type thermocouples
Vakuummeter Corrosion-proof capacitance diaphragm gauge (3.8E-5 to 1125 torr)
Vakuumpumpe Double-stage rotary vane pump with KF25 adaptor; achieves ~1E-2 torr
Tube Dimensions Fused quartz tube, 60 mm O.D. x 54 mm I.D. x 1000 mm length
Mitgeliefertes Zubehör Four quartz crucibles, gas flow control system, water chiller (16 L/min), mobile carts

Typische Anwendungsbereiche

This furnace system is ideal for research and development of multilayer 2D TMD materials via HPCVD, enabling precise control over multilayer deposition sequences and temperature gradients. It supports vacuum and inert gas atmospheres, suitable for advanced material synthesis in semiconductor, optoelectronic, and nanomaterial laboratories.

Hinweise zur Konfiguration und zum Betrieb

The system includes safety interlocks that cut power if the split cover is opened during operation. The furnace surface remains below 60°C due to air cooling. Users should limit gas flow rates to below 200 SCCM to prevent thermal shock to the quartz tube and ensure vacuum pressures do not exceed 0.2 bar. A two-stage pressure regulator is required on gas cylinders to maintain safe operating pressures below 3 PSI. Optional PC control software and Eurotherm controllers can enhance temperature accuracy and enable remote monitoring and control.

Produktbezogene Informationen

KSL-1500X-GS125 laboratory product view 1
YLJ-SPS-1200 laboratory product view 2
HP-500V laboratory product view 1
MSK-USP-12 laboratory product view 1
Zum Seitenanfang scrollen