OTF-1200X-III-HVC-LD Three-Zone Tube Furnace with High Vacuum Station and 4-Channel Mass Flow Controller for CVD
The OTF-1200X-III-HVC-LD is engineered to support advanced laboratory processes requiring precise thermal and atmospheric control, such as chemical vapor deposition (CVD), diffusion, and other heat treatments under vacuum or protective gas environments. This system integrates a three-zone tube furnace with a high vacuum station and a multi-channel mass flow controller to enable complex gas mixing and vacuum conditions.
The furnace utilizes a fused quartz tube as the processing chamber, suitable for vacuum and low-pressure applications below 0.2 bar. It achieves a maximum temperature of 1200°C with continuous operation up to 1100°C. The heating zones are independently controlled by three precision PID temperature controllers, each managing a 300 mm section of the 900 mm total heating length, ensuring uniform temperature distribution and programmable heating profiles.
Key Features
- Three-zone tube furnace with Fe-Cr-Al-Mo alloy heating elements and fused quartz processing tube.
- High vacuum station with Pfeiffer molecular pump capable of reaching ultimate pressures below 1E-8 mbar.
- 4-channel digital mass flow controller system with stainless steel MFCs for precise gas mixing and flow control.
- Automatic air cooling with built-in thermostat activating above 55°C for casing temperature management.
- Vacuum sealing assembly including stainless steel flanges, mechanical pressure gauge, needle valves, and KF-40 connector.
- Programmable heat-up rate from 1 to 20°C per minute with ±1°C temperature accuracy.
- Compatible with various gas types including nitrogen, helium, and hydrogen with specified volume flow rates.
Technical Specifications
| Parameter | Specification |
|---|---|
| Maximum Temperature | 1200°C |
| Continuous Working Temperature | 1100°C |
| Heating Zones | 3 zones, each 300 mm, total 900 mm |
| Heating Element | Fe-Cr-Al alloy doped with Mo |
| Processing Tube | Fused quartz tube (one included) |
| Temperature Control | Three PID controllers, ±1°C accuracy, K-type thermocouple |
| Vacuum Station Pump | Pfeiffer molecular pump (Germany) |
| Vacuum Range | 1000 mbar to <1E-7 mbar; ultimate pressure <1E-8 mbar |
| Mass Flow Controllers | 4 channels, stainless steel, flow ranges 0-100 SCCM, 1-199 SCCM, 1-199 SCCM, 1-499 SCCM |
| Power Supply | AC 208-240V, Single Phase, 50/60Hz |
| Furnace Power | 7 kW |
| Vacuum Station Power | 110 W, 110/220 VAC |
| Heat-up Rate | Programmable 1-20°C/min |
Typical Applications
Ideal for chemical vapor deposition (CVD), diffusion processes, thermal annealing, and other vacuum or controlled atmosphere heat treatments in research and development laboratories.
Configuration & Operating Notes
The system includes one fused quartz processing tube and a vacuum sealing assembly with stainless steel flanges and valves. Optional accessories such as bubblers or evaporators for CVD can be ordered separately. For safe operation, a two-stage pressure regulator must be installed on gas cylinders to limit pressure below 3 PSI. Gas flow rates should be kept under 200 SCCM to prevent thermal shock to the quartz tube. Temperature calibration is recommended for accurate internal furnace readings.
Dimensions & Shipping
| Product dimensions | 1100(L) x 450(W) x 670(H), mm |
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