VTC-150-H PVD/CVD Hybrid Coater for Multi-layer Film Coating with 1100°C Vertical Tube Furnace and Adjustable Magnetron Sputtering
The VTC-150-H is engineered to address the challenges of depositing multi-layer films with precise control over coating uniformity and material composition. It combines physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes within a compact vertical tube furnace environment, enabling high-temperature treatments up to 1100°C. This integration facilitates advanced coating workflows for research and development in thin film technologies.
The system incorporates a rotary sample stage with a 3″ diameter, adjustable rotation speeds from 1 to 10 rpm, ensuring even coating distribution. A 1″ diameter water-cooled magnetron sputtering head is mounted with adjustable spacing from 60 to 100 mm above the sample stage. The coater supports a variety of metallic targets, including copper, silver, platinum, and others, with the capability to reach ultra-high vacuum levels down to 4.0E-6 Torr when combined with appropriate pumping equipment.
Key Features
- Integrated 1100°C single-zone vertical tube furnace for high-temperature coating processes.
- 1″ water-cooled magnetron sputtering head with adjustable distance (60-100 mm) for flexible deposition control.
- Rotary sample stage (3″ diameter) with adjustable rotation speed (1-10 rpm) for uniform film thickness.
- 6″ color touchscreen panel with PLC integration for comprehensive monitoring and control of vacuum, current, and process parameters.
- Vacuum capability down to < 4.0E-6 Torr with appropriate pumps; supports both vane and turbomolecular pumps.
- Includes one 1″ copper target (1″ Dia. x 2.5 mm thick) for initial testing; compatible with multiple metallic targets.
- Ar gas inlet with needle valve for plasma generation; requires external Ar gas tank and pressure regulator (not included).
Technical Specifications
| Parameter | Specification |
|---|---|
| Power Supply | 208 – 240 VAC, 50/60 Hz, single phase |
| Power Consumption | 3000 W |
| Furnace Type | Single zone vertical tube furnace, 5″ diameter, max 1100°C |
| Sputtering Head | 1″ flexible magnetron with water cooling jacket |
| Sputtering Head Distance | Adjustable 60 – 100 mm from sample stage |
| Sample Stage | Rotary, 3″ diameter, adjustable speed 1 – 10 rpm |
| Vacuum Ports | Built-in KF25 vacuum port |
| Ultimate Vacuum Pressure | < 1.0E-2 Torr (vane pump), < 1.0E-5 Torr (turbomolecular pump), < 4.0E-6 Torr (overnight pumping and baking) |
| Gas Atmosphere | Argon gas inlet with needle valve (external Ar tank and regulator required) |
| Included Target | One 1″ copper target (1″ Dia. x 2.5 mm thick) |
| Control Panel | 6″ color touchscreen with PLC integration |
Typical Applications
The VTC-150-H is suitable for research and development of multi-layer thin films in electronics, optics, and materials science. It enables coating of metallic films such as copper, silver, platinum, and others on substrates requiring high-temperature processing. The system is also applicable for preparing powders with core-shell structures and special coatings for additive manufacturing and solid-state electrolytes.
Configuration & Operating Notes
The system includes a water recirculating chiller for sputtering head cooling and a rotary sample stage installed on the furnace bottom flange. It requires external vacuum pumps (vane or turbomolecular) and an argon gas supply with pressure regulation, which are not included. RF power source is optional for coating non-conductive materials or carbon. Users should consult recommended coating methods for specific targets such as aluminum, chromium, or nickel. Safety precautions for high temperature and vacuum operation must be observed.
