GSL-1100X-SPC-16C-LD Two-in-One Film Coater with Plasma Sputtering and Carbon Evaporation for SEM and EDAX Sample Preparation
The GSL-1100X-SPC-16C-LD is engineered to facilitate precise coating of samples for scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDAX). It addresses the need for versatile thin film deposition by integrating two coating techniques—plasma sputtering and carbon evaporation—within a single compact unit. This dual functionality supports microstructure and micro-area composition analysis by enabling coatings of various materials, including carbon, at a cost-effective scale.
The system incorporates two separate quartz glass chambers, each dedicated to one coating method. A 50 mm diameter sample stage accommodates samples up to 45 mm in coating area. The included double step rotary vane vacuum pump with a Pirani gauge and vapor trap ensures a clean vacuum environment down to 10-2 torr, essential for high-quality film deposition. For enhanced carbon evaporation performance, an optional molecular pump can be added to achieve vacuum levels as low as 10-5 torr.
Key Features
- Dual coating heads: DC sputtering head with 2″ target and thermal evaporation via tungsten wire baskets.
- Two quartz glass chambers (160 mm diameter x 120 mm height) for separate plasma sputtering and carbon evaporation processes.
- Sample stage with 50 mm diameter and maximum coating area of 45 mm diameter.
- Double step rotary vane vacuum pump included, capable of reaching 10-2 torr vacuum with vapor trap to eliminate oil mist.
- Ar gas inlet with needle valve for controlled plasma sputtering atmosphere.
- Power supplies: plasma sputtering up to 1600 VDC and 50 mA; evaporation power up to 10 VAC and 20 A for tungsten wire baskets.
- Includes one gold (Au) target (50 mm diameter x 0.12 mm) and one 3 ft carbon fiber yarn for evaporation coating.
Technical Specifications
| Parameter | Specification |
|---|---|
| Input Voltage | 208 – 240 VAC, single phase, 50/60 Hz (110V version available with 1500W transformer) |
| Power Consumption | Less than 2000 W (including pump) |
| Plasma Sputtering Output | Up to 1600 VDC and 50 mA max |
| Evaporation Output | 10 VAC max, 20 A max current (for tungsten wire baskets) |
| Working Chambers | Two quartz glass chambers, 160 mm diameter x 120 mm height |
| Sample Stage Diameter | 50 mm diameter (max coating area 45 mm diameter) |
| Vacuum Pump | Double step rotary vane vacuum pump with Pirani gauge and vapor trap, vacuum to 10-2 torr |
| Gas Atmosphere | Argon gas inlet with needle valve for plasma sputtering |
| Included Targets and Sources | One gold target (50 mm diameter x 0.12 mm), one 3 ft carbon fiber yarn for evaporation |
Typical Applications
This coater is ideal for preparing conductive coatings on samples for SEM imaging and EDAX elemental analysis, particularly in materials science research and quality control. It supports coating of lightweight metals such as aluminum, lithium, and magnesium, as well as carbon films for enhanced imaging contrast and conductivity.
Configuration and Operating Notes
The system includes an external double step rotary vane vacuum pump with vapor trap to reduce oil contamination. For improved carbon evaporation coating quality, a molecular pump upgrade is recommended (available separately) to achieve higher vacuum levels. An argon gas supply with pressure regulator is required but not included. Optional targets beyond the included gold target can be ordered to suit specific coating needs. The carbon evaporation source uses carbon fiber yarn; carbon rods are not compatible.
Dimensions & Shipping
| Product dimensions | L300mm x W400mm x H400mm |
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