GSL-1200X-50-MWPE Microwave Plasma Assisted 2″ Tube Furnace with 1200°C Max Temperature
The GSL-1200X-50-MWPE is engineered for advanced laboratory applications requiring microwave plasma-assisted chemical vapor deposition (MPCVD) and pyrolysis processes, particularly for carbon-related materials. This system integrates a 2.45 GHz microwave generator with a 2-inch outer diameter quartz tube furnace, enabling stable plasma generation within a controlled vacuum environment. It supports precise thermal processing from 800°C up to 1200°C, facilitating high-quality material synthesis and modification under reduced pressure.
The furnace incorporates a stainless steel and aluminum shield to prevent microwave radiation leakage, ensuring operator safety. The heating module, consisting of a Ni-Cr-Al wire coil embedded in a fibrous alumina insulation, is positioned inside the microwave chamber to provide rapid and uniform heating. The quartz tube, measuring 50 mm outer diameter by 44 mm inner diameter and 600 mm length, is vacuum-sealed with KF25 flanges equipped with gas inlet/outlet needle valves and a digital vacuum gauge for precise atmosphere control.
Key Features
- Integrated 1400W 2.45 GHz microwave generator with adjustable power output (10-100%) and minimal leakage (≤3 mW/cm² at 1 m).
- Heating module capable of reaching up to 1200°C with rapid heating rates up to 40°C per minute.
- 2″ OD quartz tube furnace with vacuum-sealed KF25 flanges, gas inlet/outlet, and digital vacuum gauge included.
- Programmable temperature controller with 30 segments for precise control of heating, dwell, and cooling phases within ±5°C accuracy.
- Vacuum operation down to 10⁻² torr with dry pump or 10⁻⁵ torr with turbopump (pumps sold separately).
- Safety features including microwave shielding and over-temperature protection.
- CE certified with optional NRTL or CSA certification available upon request.
Technical Specifications
| Parameter | Specification |
|---|---|
| Microwave Frequency | 2.45 GHz ±25 MHz |
| Microwave Power Output | 1400 W |
| Microwave Leakage | ≤ 3 mW/cm² at 1 meter |
| Heating Module | Ni-Cr-Al wire coil inside fibrous alumina insulation |
| Max Working Temperature | 1200°C (assisted heating) |
| Quartz Tube Dimensions | OD 50 mm × ID 44 mm × Length 600 mm |
| Vacuum Flanges | KF25 with gas inlet/outlet and needle valves |
| Vacuum Level | 10⁻² torr (dry pump), 10⁻⁵ torr (turbopump) |
| Temperature Controller | 30-segment programmable SCR controller, ±5°C accuracy |
| Power Supply | 2000 W, 208-240 VAC, single phase, 50/60 Hz |
Typical Applications
This microwave plasma-assisted tube furnace is ideal for chemical vapor deposition processes requiring plasma activation, such as diamond film growth and carbon nanotube synthesis. It is also suitable for pyrolysis and reforming of carbonaceous materials under controlled vacuum and temperature conditions.
Configuration & Operating Notes
The system includes the microwave generator, heating module, quartz tube with vacuum flanges, and a digital vacuum gauge. Vacuum pumps are not included and must be sourced separately; a dry pump is recommended for CVD applications. Operators should ensure proper microwave shielding and follow safety protocols to prevent exposure to microwave radiation. The temperature controller allows flexible programming of heating profiles to optimize process parameters.
