LVD-F1 Compact Liquid Vaporization System with Precise Temperature and Pressure Control for Lab-Scale CVD and DLCVD Applications
The LVD-F1 system is engineered to provide accurate and reliable vaporization of various liquid precursors used in chemical vapor deposition (CVD) and direct liquid delivery CVD (DLCVD) processes at the laboratory scale. It is particularly suited for handling corrosive and reactive liquids such as ethanol (ETOH), tin tetrachloride (SnCl4), titanium tetrachloride (TiCl4), trichlorosilane (SiHCl3), and diethylzinc (Zn(C2H5)2), enabling researchers to perform nanowire and thin film deposition with enhanced control and safety.
This compact vaporization system integrates a stainless steel 316 evaporating chamber capable of reaching temperatures up to 550ºC, combined with a heating gas line maintained up to 200ºC to prevent condensation of the liquid precursor. The system’s single-point temperature controller ensures stable and precise thermal management. Liquid flow rates are adjustable from 1 to 82 ml per minute, allowing fine-tuning of vapor delivery according to experimental requirements. The carrying inert gas flow is regulated via a precision float flow meter with a range of 200 to 2000 ml/min, and a pressure gauge is conveniently mounted on the front panel for real-time monitoring.
Key Features
- Corrosion-resistant SS316 evaporating chamber suitable for aggressive liquid precursors.
- Adjustable liquid flow control from 1 to 82 ±1 ml/min for precise vapor delivery.
- Heating gas line temperature control up to 200ºC to prevent condensation in delivery lines.
- Integrated pressure gauge and dual SS needle valves for accurate gas flow and pressure regulation.
- Compatibility with all MTI tube and CVD furnaces for versatile integration.
- Power input: 220V 50/60Hz with 2500W consumption; 110V operation available via transformer.
- Optional digital mass flow controller available for enhanced gas flow precision.
Technical Specifications
| Parameter | Specification |
|---|---|
| Power Input | 220V 50/60Hz, 2500 W (110V with transformer available) |
| Liquid Flow Rate | 1 – 82 ±1 ml/min adjustable |
| Evaporating Chamber Material | Stainless Steel 316 |
| Maximum Evaporator Temperature | Up to 550ºC |
| Heating Gas Line Temperature | Up to 200ºC |
| Carrying Gas Flow Control | Float flow meter 200 – 2000 ml/min adjustable; optional digital mass flow controller |
| Pressure Monitoring | Built-in pressure gauge on front panel |
| Gas In/Out Control | Two stainless steel needle valves |
| Vapor Outlet Tube Fitting | 1/4″ OD |
Typical Applications
The LVD-F1 is ideal for delivering liquid precursors in laboratory-scale CVD and DLCVD processes, particularly for the deposition of nanowires and thin films in materials science research. It supports a wide range of corrosive and reactive liquids, making it suitable for advanced semiconductor, photovoltaic, and nanomaterial fabrication studies.
Configuration & Operating Notes
The system requires an inert gas supply tank to carry vaporized precursors through the delivery lines. Customers must provide compatible 1/4″ PTFE or stainless steel tubing and a beaker for liquid containment according to their experimental setup. The LVD-F1 can be integrated with MTI tube furnaces and other CVD furnace systems. Optional accessories include a digital mass flow controller for enhanced gas flow precision. Proper handling and safety precautions should be observed when working with corrosive and volatile liquids.
