GSL-1100X-III-D11 Dual-Tube CVD Furnace with 1200°C Max Temperature for Large-Area Graphene Film Growth
The GSL-1100X-III-D11 furnace is engineered to facilitate chemical vapor deposition (CVD) processes for producing large-area graphene films and flexible electrodes. It features a dual quartz tube configuration where metallic foil substrates are wrapped around the inner tube surface, enabling uniform graphene growth on an extensive tubular area of approximately 7000 cm². This setup is particularly suited for energy storage device research and development requiring high-quality graphene sheets.
Temperature control is achieved through three independently controlled heating zones spanning a total length of 1230 mm, with a constant heating zone of 36 inches. The furnace can reach a maximum temperature of 1200°C for short durations and maintain continuous operation at 1100°C. A PID controller with 30 programmable segments ensures precise temperature stability within ±1°C. The design includes a manual tube extractor that allows safe and convenient removal of the inner tube without damaging the deposited films, facilitating subsequent transfer steps.
Key Features
- Dual quartz tube system: 280 mm outer diameter and 254 mm inner diameter tubes for large-area substrate wrapping.
- Three-zone heating with a 36″ constant temperature zone for uniform thermal processing.
- Maximum working temperature of 1200°C (up to 1 hour) and continuous operation at 1100°C.
- PID temperature controller with 30 programmable segments and ±1°C accuracy.
- Manual tube extractor for easy removal of inner tube and film handling.
- Vacuum-compatible design with KF25 port and mechanical pressure gauge for controlled atmosphere processing.
- High purity fused quartz tubes included for processing.
Technical Specifications
| Parameter | Specification |
|---|---|
| Outer Tube Diameter | 280 mm (11″) |
| Inner Tube Diameter | 254 mm (10″) |
| Tube Lengths | Outer: 2070 mm; Inner: 2310 mm |
| Heating Zones | 3 zones, each 410 mm long |
| Constant Heating Zone Length | 36 inches (~914 mm) |
| Max Working Temperature | 1200°C (up to 1 hour) |
| Continuous Working Temperature | 1100°C |
| Heating Rate | Max 10°C/min (RT to 800°C), Max 5°C/min (800 to 1100°C) |
| Temperature Controller | PID with 30 programmable segments, ±1°C accuracy |
| Thermocouples | High-quality K-type from Omega |
| Power Supply | AC 220 V, Three Phase, 50/60 Hz, 24 kW max |
| Vacuum Compatibility | 10^-2 torr (mechanical pump), 10^-4 torr (turbo pump) |
| Vacuum Ports | KF25 port with needle valve, 1/4″ tube compression fitting for gas feeding |
| Sealing | SS304 flange seals with high-temp silicon O-rings |
Typical Applications
This furnace is optimized for chemical vapor deposition of graphene films on metallic foils, enabling large-area synthesis for transparent electrodes, flexible electronics, and energy storage devices. It supports research and production workflows requiring uniform graphene growth and subsequent film transfer.
Configuration & Operating Notes
The furnace includes two high-purity fused quartz tubes and a manual tube extractor for safe handling of the inner tube with deposited films. Vacuum sealing is achieved with stainless steel flanges and silicon O-rings. The system requires connection to a vacuum pump and gas supply with pressure regulation below 3 psi for safe operation. Use of flammable gases such as hydrogen or methane should be conducted with appropriate safety measures, including operation inside a fume hood equipped with gas leak detectors.
Optional accessories include copper foil substrates for graphene growth and graphene transfer tapes for film relocation. The furnace is CE certified, and electrical components comply with UL/MET/CSA standards.
